Microstructures of ITO films deposited by d.c. magnetron sputtering with H2O introduction

Thin Solid Films

Volumn 445, Issue 2, 2003, Pages 235-240

  Nishimura, E ^a,b   Ohkawa, H ^b   Song, P K ^a   Shigesato, Y ^a  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Amorphous; d.c. Sputtering; H2O introduction; Indium tin oxide; Secondary ion mass spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; ANNEALING; CRYSTALLIZATION; DEPOSITION; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; PARTIAL PRESSURE; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; WATER;

D.C. SPUTTERING; H2O INTRODUCTION; INDIUM TIN OXIDES (ITO);

THIN FILMS;

EID: 1642389131     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01168-4     Document Type: Conference Paper

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