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Volumn 11, Issue 2, 1996, Pages 196-202
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Effect of oxygen concentration in the sputtering ambient on the microstructure, electrical and optical properties of radio-frequency magnetron-sputtered indium tin oxide films
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL MICROSTRUCTURE;
CRYSTAL ORIENTATION;
ELECTRIC CONDUCTIVITY;
ELECTRIC PROPERTIES;
GRAIN SIZE AND SHAPE;
MAGNETRON SPUTTERING;
OPTICAL PROPERTIES;
OXYGEN;
SEMICONDUCTING INDIUM COMPOUNDS;
INDIUM TIN OXIDE FILMS;
OPTICAL TRANSMITTANCE;
OPTOELECTRICAL PROPERTIES;
OXYGEN CONCENTRATION EFFECT;
RADIO FREQUENCY MAGNETRON SPUTTERING;
SPUTTERING AMBIENT;
SEMICONDUCTING FILMS;
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EID: 0030084697
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/11/2/009 Document Type: Article |
Times cited : (81)
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References (23)
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