Transmission electron microscope study of in situ polycrystalline Si film grown by catalyzer-enhanced chemical vapor deposition

Journal of the Electrochemical Society

Volumn 154, Issue 3, 2007, Pages

  Kim, Han Ki ^a   Soo Kim, Myung ^b   Park, Jeong Woo ^c   Jo Cho, Woon ^d  

^a Kumoh National Institute of Technology   (South Korea)

^b Samsung SDI   (South Korea)

^c Gwangju Institute of Science and Technology (GIST)   (South Korea)

^d Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; IN SITU PROCESSING; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

DEHYDROGENATED AMORPHOUS FILMS; FLEXIBLE SUBSTRATES; HYDROGEN CONCENTRATION; HYDROGEN DILUTION RATIO;

FILM GROWTH;

EID: 33847006636     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2422871     Document Type: Article

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