Current and future technology of low-temperature poly-Si TFT-LCDs

Journal of the Society for Information Display

Volumn 9, Issue 3, 2001, Pages 169-172

  Oana, Yasuhisa ^a  

^a Advanced LCD Technologies Development Center Co Ltd   (Japan)

Author keywords

Excimer laser annealing; Low temperature poly Si; PE CVD; TFT LCDs

Indexed keywords

EID: 0012258197     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.1828784     Document Type: Article

References (7)

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3. M Matsumura, "Excimer-Laser Processed Crystal Si TFTs on Glass," Proc Euro Display, 351-356 (1999).
4. N Ibaraki, "Low-Temperature Poly-Si TFT Technology," SID Intl Symp Digest Tech Papers, 172-175 (1999).
5. K Suzuki et al, "Low-temperature poly-silicon TFT technology and its application to 12.1-inch XGA," AMLCD '98 Digest, 5-8 (1998).
6. 2 films prepared by TEOS based PECVD," AMLCD '99 Digest, 143-146 (1999).
7. J S Im et al, "Low-Temperature Single-Crystal Si TFTs Fabricated on Si Films Processed via Sequential Lateral Solidification," IEEE Electron Dev Lett 19, No. 8, 306-308 (1998).