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Volumn 430, Issue 1-2, 2003, Pages 135-140
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Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition
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Author keywords
Dilution ratio; Microcrystalline silicon; Microstructure; Seed layer
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Indexed keywords
CRYSTAL GROWTH FROM MELT;
CRYSTAL MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYSILICON;
DILUTION RATIO;
THIN FILMS;
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EID: 0038527228
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(03)00096-8 Document Type: Conference Paper |
Times cited : (25)
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References (11)
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