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Volumn 430, Issue 1-2, 2003, Pages 135-140

Effects of dilution ratio and seed layer on the crystallinity of microcrystalline silicon thin films deposited by hot-wire chemical vapor deposition

Author keywords

Dilution ratio; Microcrystalline silicon; Microstructure; Seed layer

Indexed keywords

CRYSTAL GROWTH FROM MELT; CRYSTAL MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON;

EID: 0038527228     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00096-8     Document Type: Conference Paper
Times cited : (25)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.