Plasma emission controlled multi-target reactive sputtering for in-situ crystallized Pb(Zr,Ti)O3 thin films on 6″ Si-wafers

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3547-3553

  Vidyarthi, V S ^a   Lin, W M ^a   Suchaneck, G ^a   Gerlach, G ^a   Thiele, C ^b   Hoffmann, V ^b  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b IFW DRESDEN   (Germany)

Author keywords

Plasma emission monitoring; PZT; Reactive sputtering; Surface binding energy

Indexed keywords

BINDING ENERGY; CRYSTALLIZATION; LEAD COMPOUNDS; SEMICONDUCTOR PLASMAS; SILICON WAFERS; THIN FILMS;

PLASMA EMISSION MONITORING; REACTIVE SPUTTERING; SURFACE BINDING ENERGY;

SPUTTERING;

EID: 33846899005     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.131     Document Type: Article

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