Thermal stability of lead oxide films prepared by reactive DC magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 194, Issue 1, 2002, Pages 192-205

  Venkataraj, S ^a,b   Kappertz, O ^a   Drese, R ^a   Liesch, Ch ^a   Jayavel, R ^b   Wuttig, M ^a,c  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b ANNA UNIVERSITY   (India)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELLIPSOMETRY; MAGNETRON SPUTTERING; OXIDES; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

BAND GAP ENERGY;

LEAD COMPOUNDS;

EID: 0036863102     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-396X(200211)194:1<192::AID-PSSA192>3.0.CO;2-L     Document Type: Article

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