Chemically-Selective and Spatially-Localized Redox Activity at Ta/Ta2O5 Electrodes

Langmuir

Volumn 15, Issue 3, 1999, Pages 819-825

  Basame, Solomon B ^a   White, Henry S ^a  

^a UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; ELECTRIC POTENTIAL; NUCLEATION; REACTION KINETICS; REDOX REACTIONS; RUTHENIUM COMPOUNDS; TANTALUM; TANTALUM COMPOUNDS; THIN FILMS;

TANTALUM OXIDES;

ELECTROCHEMICAL ELECTRODES;

EID: 0033514146     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9808216     Document Type: Article

References (34)

1. Henrich, V. E.; Cox, P. A. The Surface Science of Metal Oxides; Cambridge University Press: Cambridge, 1994.
2. (a) Young, L. Anodic Oxide Films; Academic Press: New York, 1961.
3. (b) Oxides and Oxide Films; Diggle, J. W., Ed.; Marcel Dekker: New York, 1972.
4. (a) Basame, S. B.; White, H. S. J. Phys. Chem., in press.
5. (b) Basame, S. B.; White, H. S. J. Phys. Chem. 1995, 99, 16430.
6. (c) Casillas, N.; Charlebois, S. J.; Smyrl, W. H.; White, H. S. J. Electrochem. Soc. 1994, 141, 636.
7. (d) Casillas, N.; Charlebois, S. J.; Smyrl, W. H.; White, H. S. J. Electrochem. Soc. 1993, 140, L143.
8. (a) Bard, A. J.; Fan, F.-R, F.; Kwak, J.; Lev, O. Anal. Chem. 1989, 61, 132.
9. (b) Bard, A. J.; Fan, F.-R. F.; Mirkin, M. V. In Electroanalytical Chemistry; Bard, A. J., Ed.; Marcel Dekker: New York, 1994; Vol. 18, p 243.
10. (a) Engstrom, R. C.; Weber, M.; Wunder, D. J.; Burgess, R.; Winquist, S. Anal. Chem. 1986, 58, 844.
11. (b) Engstrom, R. C.; Meaney, T.; Tople, R.; Wightman, R.M. Anal. Chem. 1987, 59, 2005.
12. (c) Engstrom R. C. Anal. Chem. 1984, 56, 890.
13. (a) Macagno, V.; Schultze, J. W. J. Electroanal. Chem. 1984, 180, 157.
14. (b) Vermilyea, D. A. Acta Metall. 1953, 1, 282.
15. (c) Smith, D. J.; Young, L. Thin Solid Films 1983, 101, 11.
16. (d) Mathieu, H. J.; Landolt, D. Surf. Interface Anal. 1983, 5, 77.
17. Sung, Y.-E.; Bard, A. J. J. Phys. Chem., submitted for publication.
18. 4 solution to 11 V at a scan rate of 10 mV/s.
19. Handbook of X-ray Photoelectron Spectroscopy; Chastain, J., King, R. C., Eds.; Physical Electronics, Inc.: 1995.
20. McGuire, G. E.; Schweitzer, G. K. K.; Carlon, T. A. Inorg. Chem. 1973, 12, 2451.
21. Seah, M. P.; Dench, W. A. Surf. Interface Anal. 1979, 1, 2.
22. Scott, E. R.; White, H. S.; Phipps, J. B. Anal. Chem. 1993, 65, 1537.
23. Scott, E. R.; Laplaza, A. I.; White, H. S.; Phipps, J. B. J. Pharm. Res. 1993, 10, 1699.
24. Saito, Y. Rev. Polarogr. 1968, 15, 177.
25. von Stackelberg, M.; Pilgram, M.; Toome, V. Z. Elektrochem. 1953, 57, 342.
26. (a) Fleischmann, M.; Pons, S.; Rolison, D. R.; Schmidt, P. P. Ultramicroelectrodes; Datatech Systems: Morganton, NC, 1987.
27. (b) Wightman, R. M.; Wipf, D. O. In Electroanalytical Chemistry; Bard, A. J., Ed.; Marcel Dekker: New York, 1970; Vol. 4, p 129.
28. (a) Clechet, P.; Martin, J. R.; Ollies, R.; Vallouy, C. R. Acad. Sci. 1976, 282C, 887.
29. (b) Vijh, A. K. In Oxides and Oxide Films; Diggle, J. W., Ed.; Marcel Dekker: New York, 1972; Vol. 2.
30. Sung, Y.-E.; Gaillard; F.; Bard, A. J. J. Phys. Chem., in press.
31. Garfias-Mesias, L. F.: Alodan, M.; James, P. I.; Smyrl, W. H. Electrochem. Soc. 1998, 145, 2005.
32. -.
33. measured).
34. Lehovec, K. J. Less-Common Met. 1964, 7, 397.