Manufacturing of the first EUV full field Scanner Mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Dersch, Uwe ^a   Buettner, Rico ^a   Chovino, Christian ^a   Franz, Steffen ^a   Heins, Torben ^a   Herguth, Holger ^a   Peters, Jan Hendrik ^a   Rode, Thomas ^a   Letzkus, Florian ^b   Butschke, Joerg ^b   Irmscher, Mathias ^b  

^a Advanced Mask Technology Center   (Germany)

^b Institut fur Mikroelektronik Stuttgart   (Germany)

Author keywords

Etch; EUV; NGL; Patterning; Pilot line; Process capability; Process integration

Indexed keywords

ETCHING; INTEGRATED CIRCUIT LAYOUT; MULTILAYERS; PROJECT MANAGEMENT;

PILOT LINE; PROCESS CAPABILITY; PROCESS INTEGRATION;

MICROELECTRONICS;

EID: 33846587516     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686035     Document Type: Conference Paper

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