Evaluation of alternative capping layers for EUVL mask ML blank

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Yan, Pei Yang ^a   Spiller, Eberhard ^b   Gullikson, Eric ^c   Hill, Shannon ^d  

^a INTEL CORPORATION   (United States)

^b Spiller X ray Optics   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Euv multi layers; EUVL; Euvl mask; Euvl mask blanks; Ml capping layer

Indexed keywords

EUV MULTI-LAYERS; EUVL; EUVL MASK BLANKS; EUVL MASKS; ML CAPPING LAYERS;

DEGRADATION; MASKS; MULTILAYERS; OXIDATION RESISTANCE; SILICA; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 33644591137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637599     Document Type: Conference Paper

References (6)

1. S. Bajt, J. B. Alameda, T. W. Barbee, Jr., W. M. Clift, J. A. Folta, B. B. Kaufmann, and E. A. Spiller, "Improved reflectance and stability of Mo/Si multilayers," SPIE Vol. 4506, pp65, 2001.
2. S. Bajt, H. Chapman, N. Nguyen, J. Alameda, J. Robinson, M. Malinowski, E. Gullikson, A. Aquila, C. Tarrio, and S. Grantham, "Design and performance of capping layers for extreme-ultraviolet multilayer mirrors., App. Opt. Vol. 42, No. 28, p5750, 2003.
3. B. Mertens, M. Weiss, H. Meiling, R. Klein, E. Louis, R. Kurt, M. Wedowski, H. Trenkler, B. Wolschrijn, R. Jansen, A. Van de Runstraat, T. Moors, K. Spec, S. Ploger, and R. Van de Kruijs, "Progress in EUV optics lifetime expectations," Microelectronic Eng. 73-74, pp16, 2004.
4. Y. Kakutani, M. Niibe, H. Takase, S. Terashima, H. Kondo, S. Matsunari, T. Aoki, Y. Gomei, and Y. Fukuda, "Reflectance change of Si- and Ru-capped Mo/Si multilayer mirrors caused by intense EUV irradiation," SPIE Vol. 5751, pp 1077, 2005.
5. S. Bajt, Z. R. Dai, E. J. Nelson, M. A. Wall, J. Alameda, N. Nguyen, S. Baker, J. C. Robinson, J. S. Taylor, M. Clift, A. Aquila, E. M. Gullikson, and N. V. G. Edwards, "Oxidation resistance of Ru-capped EUV multilayers," SPIE Vol. 5751, pp118, 2005.
6. L. E. Klebanoff, M. E. Malinowski, W. M. Clift, C. Steinhaus, and P. Grunow, "Use of gas-phase ethanol to mitigate extreme UV/water oxidations of extreme UV optics," J. Vac. Sci. technal. A22, pp425, 2004.