Recent results on EUV mask blank multilayers and absorbers

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 190-199

  Seitz, Holger ^a   Sobel, Frank ^a   Renno, Markus ^a   Leutbecher, Thomas ^a   Olschewski, Nathalie ^a   Reichardt, Thorsten ^a   Walter, Ronny ^a   Becker, Hans ^a   Buttgereit, Ute ^a   Heß, Günter ^a   Knapp, Konrad ^a   Wies, Christian ^b   Lebert, Rainer ^b  

^a Schott Lithotec AG   (Germany)

^b AIXUV GmbH   (Germany)

Author keywords

Absorber; EUVL; Mask blank; Multilayer

Indexed keywords

CLEANING; DEFECTS; DRY ETCHING; LITHOGRAPHY; MASKS; MEASUREMENTS; OPTICAL PROPERTIES; SPUTTERING; THERMAL EXPANSION; ULTRAVIOLET RADIATION;

ABSORBER; CHROME-ON-GLASS; EUVL; MASK BLANK;

MULTILAYERS;

EID: 24644495128     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600538     Document Type: Conference Paper

References (7)

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3. - J.A. Folta et al., Low-defect EUVL multilayers on standard-format mask blanks, Proc. SPIE 4889, 374-381, 2002
4. - J. Tümmler et al., New PTB reflectometer for the characterization of large optics for the extreme ultraviolet spectral region, Proc. SPIE 4688,. 338-347, 2002
5. - R. Lebert et al., High Throughput EUV-Reflectometer for EUV Mask-Blanks, Proc. SPIE 5374, 808-817, 2004
6. - D. Walker, D.P. Mathur, Commercialization of EUVL Masks at Photronics, Int. Sematech EUVL Mask development Seminar, Mar 2002
7. - C. Thiel et al., Process for improved reflectivity uniformity in extreme ultraviolet lithography (EUVL) masks, Proc. SPIE 5037, 339-346, 2003