The effect of N2 partial pressure on the properties of Nb-Si-N films by RF reactive magnetron sputtering

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5412-5415

  Song, Z X ^a   Wang, Y ^b   Wang, C J F ^a   Liu, C L ^a   Xu, K W ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

Author keywords

Magnetron sputtering; N2 partial pressure; Nb Si N film

Indexed keywords

GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PARTIAL PRESSURE; SURFACE ROUGHNESS;

CHARACTERIZERS; GAS MIXTURE; REACTIVE MAGNETRON SPUTTERING;

NIOBIUM COMPOUNDS;

GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NIOBIUM COMPOUNDS; PARTIAL PRESSURE; SURFACE ROUGHNESS;

EID: 33846520417     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.047     Document Type: Article

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