Hole-type two-dimensional photonic crystal fabricated in silicon on insulator wafers

Sensors and Actuators, A: Physical

Volumn 133, Issue 2 SPEC. ISS., 2007, Pages 388-394

  Teo, Selin H G ^a   Liu, A Q ^a   Singh, J ^b   Yu, M B ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Hole type Phc; Photonic crystal; Silicon on Insulator fabrication

Indexed keywords

CRYSTAL STRUCTURE; ETCHING; LITHOGRAPHY; PHOTONS; SILICON ON INSULATOR TECHNOLOGY;

HOLE-TYPE PHC; PHOTONIC CRYSTAL; SILICON-ON-INSULATOR FABRICATION; TIME-MULTIPLEXED REACTIVE ION ETCHING (TMRIE);

CRYSTALS;

EID: 33846484842     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2006.06.030     Document Type: Article

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