Deeply etched two-dimensional photonic crystals fabricated on GaAs/AlGaAs slab waveguides by using chemically assisted ion beam etching

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 875-880

  Avary, K ^a   Reithmaier, J P ^a   Klopf, F ^a   Happ, T ^a   Kamp, M ^a   Forchel, A ^a  

^a UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

Chemically assisted ion beam etching (CAIBE); Reactive ion etching (RIE); Two dimensional photonic crystals

Indexed keywords

CRYSTALS; ELECTRON BEAM LITHOGRAPHY; ION BEAMS; REACTIVE ION ETCHING; SEMICONDUCTING GALLIUM ARSENIDE; SPECTROSCOPIC ANALYSIS; SURFACES;

CHEMICALLY ASSISTED ION BEAM ETCHING (CAIBE);

OPTICAL WAVEGUIDES;

EID: 17344384323     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00454-9     Document Type: Conference Paper

References (6)

1. Channel drop tunneling through localized states
2. Physical and device applications of optical microcavities
3. Two-dimensional photonic band-gap defect mode laser
4. Ultrahigh vacuum chemically assisted ion beam etching system with a three grid ion source
5. Modal reflectivity in finite-depth two-dimensional photonic-crystal microcavities