Deep reactive ion etching for pillar type nanophotonic crystal

International Journal of Nanoscience

Volumn 4, Issue 4, 2005, Pages 567-574

  Teo, Selin H G ^a   Liu, A Q ^a   Sia, G L ^a   Lu, C ^a   Singh, J ^b   Yu, M B ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Deep reactive ion etching; Nanofabrication; Photonic crystal

Indexed keywords

CHARACTERIZATION; LITHOGRAPHY; NANOTECHNOLOGY; PHOTONS; REACTIVE ION ETCHING; SILICON; ULTRAVIOLET RADIATION;

DEEP REACTIVE ION ETCHING; PHOTONIC CRYSTALS; PROCESS PARAMETERS; UV LITHOGRAPHY;

CRYSTAL STRUCTURE;

EID: 28844453712     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0219581X05003590     Document Type: Article

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