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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1052-1059

Deep-ultraviolet resist contamination for copper/low-k dual-damascene patterning

(5) Kumar, R a Singh, N a Chang, C K a Dong, L a Wong, T K S b

a INSTITUTE OF MICROELECTRONICS (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CLEANING; CONTAMINATION; COPPER; DIELECTRIC DEVICES; ETCHING; INTEGRATED CIRCUITS; LITHOGRAPHY; PHOTORESISTS; SILICA; SURFACE PHENOMENA;

DEEP-ULTRAVIOLET (DUV) LITHOGRAPHY; RESIST POISONING; STRIPPING; VIA FIRST DUEL-DAMASCENE (VFDD);

ULTRAVIOLET RADIATION;

EID: 3242680816 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1738672 Document Type: Article

Times cited : (10)

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