In situ spectroscopic ellipsometry analyses of hafnium diboride thin films deposited by single-source chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 1, 2007, Pages 200-206

  Yang, Yu ^a   Jayaraman, Sreenivas ^a   Sperling, Brent ^a   Kim, Do Young ^a,b   Girolami, Gregory S ^a,b   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL RESISTIVITY; FILM THICKNESS; HAFNIUM DIBORIDE;

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; HAFNIUM COMPOUNDS; SILICA; SUBSTRATES;

THIN FILMS;

EID: 33846195075     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2409939     Document Type: Article

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