HfB2 and Hf-B-N hard coatings by chemical vapor deposition

Surface and Coatings Technology

Volumn 200, Issue 22-23 SPEC. ISS., 2006, Pages 6629-6633

  Jayaraman, S ^a   Gerbi, J E ^a   Yang, Y ^a   Kim, D Y ^a,b   Chatterjee, A ^a   Bellon, P ^a   Girolami, G S ^a,b   Chevalier, J P ^c   Abelson, J R ^a  

^a United States of America   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c CNRS   (France)

Author keywords

CVD; Hafnium borohydride; Hafnium diboride; Hard coating; Nanocomposite; Nanoindentation

Indexed keywords

ANNEALING; DEPOSITION; HAFNIUM COMPOUNDS; HARDNESS; NANOSTRUCTURED MATERIALS; THIN FILMS;

ATOMIC NITROGEN; DEPOSITION TEMPERATURE; GROWTH FLUX; HAFNIUM BOROHYDRIDE; HAFNIUM DIBORIDE; HARD COATINGS; LOW ELASTIC MODULUS;

CHEMICAL VAPOR DEPOSITION;

ANNEALING; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HAFNIUM COMPOUNDS; HARDNESS; NANOSTRUCTURED MATERIALS; THIN FILMS;

EID: 33646125423     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.11.040     Document Type: Article

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