Electron holographic study of the effect of contact resistance of connected nanowires on resistivity measurement

Surface and Interface Analysis

Volumn 38, Issue 12-13, 2006, Pages 1628-1631

  Takeguchi, M ^a   Shimojo, M ^a,b   Tanaka, M ^a   Che, R ^a   Zhang, W ^a   Furuya, K ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Electron beam induced deposition; Electron holography; Nanowire; Resistivity; Transmission electron microscopy

Indexed keywords

DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON BEAMS; ELECTRON HOLOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY;

CONTACT RESISTANCE; ELECTRON BEAM INDUCED DEPOSITION; NANOWIRES;

NANOSTRUCTURED MATERIALS;

EID: 33845947352     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2403     Document Type: Conference Paper

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