ToF-SIMS studies of nanoporous PMSSQ materials: Kinetics and reactions in the processing of low-K dielectrics for ULSI applications

Surface and Interface Analysis

Volumn 36, Issue 4, 2004, Pages 304-310

  Lazzeri, P ^a   Rubloff, G W ^b   Vanzetti, L ^a   Briber, R M ^b   Anderle, M ^a   Bersani, M ^a   Park, J J ^b   Kim, H C ^c   Volksen, W ^c   Miller, R D ^c   Lin, Z ^b  

^a ITC IRST   (Italy)

^b UNIVERSITY OF MARYLAND   (United States)

^c IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Degradation; Kinetics; Low K; PMMA co DMAEMA; PMSSQ; Polymerization; Porogen; ToF SIMS

Indexed keywords

ANNEALING; COPOLYMERS; DIELECTRIC MATERIALS; NANOSTRUCTURED MATERIALS; POLYMERIZATION; POLYMETHYL METHACRYLATES; PYROLYSIS; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY; SILICA;

LOW-K; PMMA-CO-DMAEMA; PMSSQ; POROGEN; TOF-SIMS;

ULSI CIRCUITS;

EID: 11144355396     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1658     Document Type: Article

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