Perforated polymer membranes fabricated by nanoimprint

Microelectronic Engineering

Volumn 83, Issue 4-9 SPEC. ISS., 2006, Pages 873-875

  Schift, Helmut ^a,b   Bellini, Sandro ^a,b   Gobrecht, Jens ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES AND ARTS NORTHWESTERN SWITZERLAND   (Switzerland)

Author keywords

Lift off resist; Membrane; Nanoimprint lithography; Sacrificial layer; Support column; Thermoplastic polymer

Indexed keywords

DISSOLUTION; POLYMERIC MEMBRANES; PORE SIZE; REACTIVE ION ETCHING;

HOLE PATTERNS; NANOIMPRINT; PERFORATED POLYMER MEMBRANES;

NANOTECHNOLOGY;

EID: 33646045618     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.12.027     Document Type: Article

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