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Volumn 156, Issue 1-2, 2006, Pages 61-67

Properties of ITO films prepared by reactive magnetron sputtering

Author keywords

Dual magnetron sputtering; ITO thin films; Optical properties; Oxygen flow rate; Residual stress

Indexed keywords


EID: 33751424398     PISSN: 00263672     EISSN: 14365073     Source Type: Journal    
DOI: 10.1007/s00604-006-0591-0     Document Type: Conference Paper
Times cited : (7)

References (21)
  • 16
    • 0037997768 scopus 로고    scopus 로고
    • Joint Committee on Powder Diffraction Standards, ASTM, Philadelphia, Card 06-0416
    • Powder Diffraction File, Joint Committee on Powder Diffraction Standards, ASTM, Philadelphia, Card 06-0416
    • Powder Diffraction File


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.