Fabrication of high aspect ratio nanostructures using capillary force lithography

Korean Journal of Chemical Engineering

Volumn 23, Issue 4, 2006, Pages 678-682

  Suh, Kahp Yang ^a   Jeong, Hoon Eui ^a   Park, Jee Won ^a   Lee, Sung Hoon ^a   Kim, Jae Kwan ^a  

^a Seoul National University   (South Korea)

Author keywords

Aspect ratio; Capillary force lithography; Laplace pressure; Nanostructures

Indexed keywords

EID: 33751269893     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02706814     Document Type: Article

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