Thickness-dependent structural transformation in the AlN film

Acta Materialia

Volumn 53, Issue 19, 2005, Pages 5223-5227

  Chen, D ^a   Ma, X L ^a   Wang, Y M ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

AlN structural transformation; Critical thickness; Epitaxially stabilized

Indexed keywords

COMPUTER SIMULATION; EPITAXIAL GROWTH; FILM GROWTH; HIGH PRESSURE EFFECTS; PHASE TRANSITIONS; THIN FILMS;

ALN STRUCTURAL TRANSFORMATION; ATOMIC DYNAMICS; CRITICAL THICKNESS; EPITAXIALLY STABILIZED;

ALUMINUM NITRIDE;

EID: 26644449814     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2005.08.003     Document Type: Article

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