Deposition temperature and thickness effects on the characteristics of dc-sputtered ZrNx films

Materials Chemistry and Physics

Volumn 86, Issue 2-3, 2004, Pages 370-374

  Liu, Chuan Pu ^a   Yang, Heng Ghieh ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Preferred orientation; Reactive dc sputtering; Resistivity; ZrNx

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; INTERFACIAL ENERGY; MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; X RAY DIFFRACTION ANALYSIS;

DEPOSITION TEMPERATURE; PREFERRED ORIENTATION; REACTIVE DC SPUTTERING; ZRNX;

ZIRCONIUM COMPOUNDS;

EID: 2942668314     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.03.026     Document Type: Article

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