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Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 180-186

Effect of germanium addition on the properties of reactively sputtered ZrN films

(4) Pilloud, D a Pierson, J F a Cavaleiro, A b Marco De Lucas, M C c

a FEMTO ST INSTITUTE (France)

b UNIVERSITY OF COIMBRA (Portugal)

c UNIVERSITÉ DE BOURGOGNE (France)

Author keywords

Hardness; Oxidation; Reactive sputtering; ZrN

Indexed keywords

COATING TECHNIQUES; COMPOSITE MATERIALS; COMPRESSIVE STRESS; ELECTRIC POTENTIAL; GERMANIUM; HARDNESS; MICROANALYSIS; MIXTURES; OXIDATION; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

MICRO-RAMAN SPECTROSCOPY; REACTIVE SPUTTERING; ZRN;

THIN FILMS;

EID: 25844498147 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.06.051 Document Type: Article

Times cited : (22)

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