Metal-induced nanocrystalline structures in Ni-containing amorphous silicon thin films

Journal of Applied Physics

Volumn 100, Issue 9, 2006, Pages

  Ferri, F A ^a   Zanatta, A R ^a   Chambouleyron, I ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL STRUCTURE; CRYSTALLIZATION; SILICON; THIN FILMS;

COSPUTTERING TECHNIQUE; IMPURITY CONCENTRATION; LOW TEMPERATURE CRYSTALLIZATION; NANOCRYSTAL STRUCTURES;

NANOSTRUCTURED MATERIALS;

EID: 33751104172     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2362877     Document Type: Article

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