Stress-assisted nickel-induced crystallization of silicon on glass

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages 966-970

  Hashemi, P ^a   Derakhshandeh, J ^a   Mohajerzadeh, S ^a   Robertson, M ^b   Tonita, A ^b  

^a UNIVERSITY OF TEHRAN   (Iran)

^b ACADIA UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; COMPRESSIVE STRESS; CRYSTALLIZATION; GLASS; GROWTH KINETICS; MICROELECTRONICS; NICKEL; NUCLEATION; SCANNING ELECTRON MICROSCOPY; STRESS ANALYSIS; TENSILE STRESS; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

MECHANICAL STRAIN; POLYCRYSTALLINE GROWTH; SOLID-PHASE CRYSTALLIZATION (SPC); THERMAL EXPANSION COEFFICIENTS;

POLYSILICON;

EID: 3142611783     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1722271     Document Type: Conference Paper

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