Low-temperature Al-induced crystallization of amorphous Ge

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Zanatta, A R ^a   Chambouleyron, I ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED TRANSMISSION SPECTROSCOPY; LOW-TEMPERATURE CRYSTALLIZATION; METAL-INDUCED CRYSTALLIZATION; PROTON-INDUCED X-RAY EMISSION (PIXE);

ALUMINUM; ANNEALING; CRYSTALLIZATION; DOPING (ADDITIVES); GERMANIUM; HYDROGEN BONDS; HYDROGENATION; INFRARED SPECTROSCOPY; LOW TEMPERATURE EFFECTS; MORPHOLOGY; RAMAN SCATTERING; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILMS;

EID: 18844367237     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1889227     Document Type: Article

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