Nickel distribution in crystalline and amorphous silicon during solid phase epitaxy of amorphous silicon

Journal of Applied Physics

Volumn 84, Issue 12, 1998, Pages 6644-6649

  Kuznetsov, A Yu ^a,b   Svensson, B G ^a   Nur, O ^c   Hultman, L ^c  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001533332     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369039     Document Type: Article

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