Silicon-germanium interdiffusion and interfaces in self-assembled quantum dots

Applied Physics A: Materials Science and Processing

Volumn 86, Issue 1, 2007, Pages 1-9

  Vanfleet, R R ^a   Basile, D P ^b   Kamins, T I ^c   Silcox, J ^a   Williams, R Stanley ^c  

^a School of Chemical and Molecular Engineering   (United States)

^b AGILENT LABORATORIES   (United States)

^c HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MONOLAYERS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS ZONES; CRYSTALLINE INTERFACES; EQUILIBRIUM DISTRIBUTION; SCANNING TRANSMISSION ELECTRON MICROSCOPE (STEM);

SEMICONDUCTOR QUANTUM DOTS;

EID: 33750999590     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-006-3724-8     Document Type: Article

References (26)

1. D.J. Eaglesham, M. Cerullo, Phys. Rev. Lett. 64, 1943 (1990)
2. Y.-W. Mo, D.E. Savage, B.S. Swartzentruber, M.G. Lagally, Phys. Rev. Lett. 65, 1020 (1990)
3. M. Krishnamurthy, J.S. Drucker, J.A. Venables, J. Appl. Phys. 69, 6461 (1991)
4. G. Medeiros-Ribeiro, A.M. Bratkovisk, T.I. Kamins, D.A.A. Ohlberg, R.S. Williams, Science 279, 353 (1998)
5. T.I. Kamins, G. Medeiros-Ribeiro, D.A.A. Ohlberg, R.S. Williams, Appl. Phys. A 67, 727 (1998)
6. R.S. Williams, G. Medeiros-Ribeiro, T.I. Kamins, D.A.A. Ohlberg, J. Phys. Chem. B 102, 9605 (1998)
7. W. Dorsch, H.P. Strunk, H. Wawra, G. Wagner, J. Groenen, R. Carles, Appl. Phys. Lett. 72, 179 (1998)
8. J. Tersoff, F.K. LeGuoes, Phys. Rev. Lett. 72, 3570 (1994)
9. J.A. Floro, E. Chason, R.D. Twesten, R.Q. Hwang, L.B. Freund, Phys. Rev. Lett. 79, 3946 (1997)
10. W.L. Henstrom, C.P. Liu, J. Gibson, T. Kamins, R.S. Williams, Appl. Phys. Lett. 77, 1623 (2000)
11. G. Capellini, M. De Seta, F. Evangelisti, Appl. Phys. Lett. 78, 303 (2001)
12. R. Magalhaes-Paniago, G. Medeiros-Ribeiro, A. Malachias, S. Kycia, T.I. Kamins, R.S. Williams, Phys. Rev. B 66, 245312 (2002)
13. M. Floyd, Y. Zhang, K.P. Driver, J. Drucker, P.A. Crozier, D.J. Smith, Appl. Phys. Lett. 82, 1473 (2003)
14. D.J. Smith, D. Chandrasekhar, S.A. Chaparro, P.A. Crozier, J. Drucker, M. Floyd, M.R. McCartney, Y. Zhang, J. Cryst. Growth 259, 232 (2003)
15. G. Katsaros, G. Costantini, M. Stoffel, R. Esteban, A.M. Bittner, A. Rastelli, U. Denker, O.G. Schmidt, K. Kern, Phys. Rev. B 72, 195320 (2005)
16. T.U. Schulli, M. Stoffel, A. Hesse, J. Stangl, R.T. Lechner, E. Wintersberger, M. Sztucki, T.H. Metzger, O.G. Schmidt, G. Bauer, Phys. Rev. B 71, 035326 (2005)
17. S.J. Klepeis, J.P. Benedict, R.M. Anderson, Specimen Preparation for Transmission Electron Microscopy (Materials Research Society, Boston, 1988)
18. L. Reimer, Transmission Electron Microscopy (Springer, Berlin, 1993)
19. R. Loane, P. Xu, J. Silcox, Acta Cryst. A 47, 267 (1991)
20. E.J. Kirkland, Advanced Computing in Electron Microscopy (Springer, New York, 1999)
21. S. Hillyard, J. Silcox, Ultramicroscopy 52, 325 (1993)
22. R.F. Egerton, Electron Energy-Loss Spectroscopy in the Electron Microscope (Plenum, New York, 1996)
23. P. Hartel, H. Rose, C. Dinges, Ultramicroscopy 63, 93 (1996)
24. B.E. Warren, X-Ray Diffraction (Dover, New York, 1990)
25. D.D. Perovic, C.J. Rossouw, A. Howie, Ultramicroscopy 52, 353 (1993)
26. S. Hillyard, R. Loane, J. Silcox, Ultramicroscopy 49, 14 (1993)