Strain-induced island scaling during Si1-xGex heteroepitaxy

Applied Physics Letters

Volumn 72, Issue 2, 1998, Pages 179-181

  Dorsch, W ^a   Strunk, H P ^a   Wawra, H ^b   Wagner, G ^b   Groenen, J ^c   Carles, R ^c  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b LEIBNIZ INSTITUTE FOR CRYSTAL GROWTH   (Germany)

^c UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000332808     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120622     Document Type: Article

References (17)

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