Influence of bias voltage on morphology and structure of MgO thin films prepared by cathodic vacuum arc deposition

Surface and Coatings Technology

Volumn 201, Issue 6, 2006, Pages 2387-2391

  Zhu, Daoyun ^a   Zheng, Changxi ^a   Liu, Yi ^a   Chen, Dihu ^a   He, Zhenhui ^a   Wen, Lishi ^a   Cheung, W Y ^b   Wong, S P ^b  

^a State Key Laboratory of Optoelectronic Materials and Technologies   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Cathodic vacuum arc deposition; MgO films; Plasma display panel (PDP)

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRIC POTENTIAL; GRAIN GROWTH; MAGNESIA; MORPHOLOGY; OPACITY; PLASMA DISPLAY DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

CATHODIC VACUUM ARC DEPOSITION; HIGH ENERGY IONS; PULSE BIAS VOLTAGE;

VACUUM DEPOSITED COATINGS;

ATOMIC FORCE MICROSCOPY; COMPOSITION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; ELECTRIC POTENTIAL; GRAIN GROWTH; MAGNESIA; MORPHOLOGY; OPACITY; PLASMA DISPLAY DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; VACUUM DEPOSITED COATINGS;

EID: 33750985963     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.04.009     Document Type: Article

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