Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering

Surface and Coatings Technology

Volumn 110, Issue 3, 1998, Pages 128-135

  Park, Chung Hoo ^a   Lee, Woo Geun ^a   Kim, Dong Hyun ^a   Ha, Hong Ju ^b   Ryu, Ju Youn ^b  

^a Pusan National University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

MgO thin film; Plasma display panel; Reactive magnetron sputtering; Surface discharge

Indexed keywords

ANNEALING; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; ELECTRON BEAMS; FILM PREPARATION; GLOW DISCHARGES; MAGNESIA; MAGNETRON SPUTTERING; PLASMA DISPLAY DEVICES; SURFACE DISCHARGES; TRANSPARENCY;

PLASMA DISPLAY PANELS;

THIN FILMS;

EID: 0032303592     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00683-5     Document Type: Article

References (18)

1. Byrum B.W. Jr. IEEE Trans. ED22:1975;685-691.
2. Aboelforth M.O., Lorezen J.A. J. Appl. Phys. 48(11):1977;4754-4759.
3. Sahni O., Aboelfotoh M.O. Proc. SID. 22(4):1981;212-218.
4. H. Lin et al., 1995 Asia SID Symposium Digest on Technical papers (1995) 70-74.
5. Andoh S., Murase K., Umeda S., Nakayama N. IEEE Trans. ED23:1976;319-324.
6. Uchike H., Miura K., Nakayama N., Shinoda T., Fukushima Y. IEEE Trans. ED23:1976;1211-1217.
7. N.T. Nguyen, H. Nakahara, M. Wakitani, A. Otsuka, T. Shinada, IDW'96 (1996) 295-298.
8. K. Machida, H. Uchike, H. Sasaki, SID '92 Digest (1992) 531-534.
9. Urade T., Iemori T., Osawa M., Nakayama N., Morita I. IEEE Trans. ED23(3):1976;313-318.
10. K. Machida, H. Uchiike, H. Sasaki, SID '92 Digest (1992) 531-534.
11. M. Hakomori, Y. Hibino, K. Matsuzaki, T. Kurauchi, M. Matsuura, H. Yamakawa, IDW '97 (1997) 551-554.
12. C. Paube, H. Frankenberger, J. Stollenwerk, IDW '97 (1997) 555-558.
13. Park C.H., Sung Y.M., Lee W.G. Thin Solid Films. 312(1)(2):1998;188-195.
14. Y. Terao, R. Masuda, I. Koiwa, N. Higemoto, H. Sawai, T. Kanamori, SID '92 Digest (1992) 724-727.
15. H. Fujii, H. Tanabe, M. Ishiga, M. Harayama, M. Oka, SID '92 Digest (1992) 728-731.
16. Sahi O., Lanza C. J. Appl. Phys. 47(11):1976;5107-5108.
17. M.H. Francambe, L. Vossen, Physics of Thin Films, Academic Press (1994) 76-80.
18. M. Ohring, The Material Science of Thin Films, Academic Press (1991) 223-234.