A modified, filtered, pulsed cathodic vacuum arc implantation and deposition apparatus with the filtering duct working as a second anode

Surface and Coatings Technology

Volumn 128-129, Issue 1, 2000, Pages 470-473

  Guangfu, Wang ^a   Huixing, Zhang ^a   Xiaoji, Zhang ^a   Yuguang, Wu ^a   Renhe, Tian ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Cathode erosion rate; Cathodic arc; Duct output; Duct potential; Filtering duct; Second anode action

Indexed keywords

ANODES; CATHODES; ELECTRIC CURRENTS; EROSION; MAGNETIC FIELD EFFECTS; PLASMA SOURCES;

CATHODE EROSION RATE; PULSED CATHODIC VACUUM ARC DEPOSITION; PULSED CATHODIC VACUUM ARC IMPLANTATION;

DEPOSITION;

EID: 0033683412     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00620-4     Document Type: Article

References (6)

1. Aksenov, V.A. Belous, V.G. Padalka, Sov. J. Plasma Phys., 4 (1978) 428.
2. A. Anders, S. Anders, I.G. Brown, Plasma Source Sci. Technol. 76/77 (1995) 167.
3. R. Lossy, D.L. Pappas, R.A. Roy, J. Appl. Phys. 77 (1995) 4750.
4. S. Anders, A. Anders, I.G. Brown, J. Appl. Phys. 74 (1993) 4239.
5. V.N. Zhitomirsky, R.L. Boxman, S. Goldsmith, Surf. Coat. Technol. 68/69 (1994) 146.
6. W. Guangfu, Z. Huixing, Z. Xiaoji, J. Beijing Normal University (Nat. Sci.) 33 (1997) 361.