Silicon nanowhiskers grown on 〈111〉Si substrates by molecular-beam epitaxy

Applied Physics Letters

Volumn 84, Issue 24, 2004, Pages 4968-4970

  Schubert, L ^a   Werner, P ^a   Zakharov, N D ^a   Gerth, G ^a   Kolb, F M ^a   Long, L ^a   Gosele U ^a   Tan, T Y ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPY; SILICON NANOWHISKERS; VAPOR-LIQUID-SOLID (VLS) GROWTH;

CATALYSIS; CHEMICAL VAPOR DEPOSITION; CRYSTAL WHISKERS; DIFFUSION; EUTECTICS; INTEGRATION; MOLECULAR BEAM EPITAXY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR GROWTH; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

NANOSTRUCTURED MATERIALS;

EID: 3042816929     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1762701     Document Type: Article

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