Ti-catalyzed Si nanowires by chemical vapor deposition: Microscopy and growth mechanisms

Journal of Applied Physics

Volumn 89, Issue 2, 2001, Pages 1008-1016

  Kamins, T I ^a   Williams, R Stanley ^a   Basile, D P ^b   Hesjedal, T ^c   Harris, J S ^c  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b AGILENT LABORATORIES   (United States)

^c Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000434281     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1335640     Document Type: Article

References (25)

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