Comment on “quantum interferometric optical lithography: Exploiting entanglement to beat the diffraction limit”

Physical Review Letters

Volumn 86, Issue 7, 2001, Pages 1389-

  Agarwal, Girish S ^a   Boyd, Robert W ^b   Nagasako, Elna M ^b   Bentley, Sean J ^b  

^a PHYSICAL RESEARCH LABORATORY   (India)

^b UNIVERSITY OF ROCHESTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85029014145     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.1389     Document Type: Note

References (1)

1. A. N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams, and J. P. Dowling; Phys. Rev. Lett. 85, 2733 (2000).