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1
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0035476926
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Lateral profiling of impurity surface concentration in submicron metal-oxide-silicon transistors
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Wang Y., and Sah C.-T. Lateral profiling of impurity surface concentration in submicron metal-oxide-silicon transistors. J Appl Phys 90 (2001) 3539-3550
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(2001)
J Appl Phys
, vol.90
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Wang, Y.1
Sah, C.-T.2
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2
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79952367287
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DCIV diagnosis for submicron MOS transistor design, process, reliability and manufacturing
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Sah C.-T. DCIV diagnosis for submicron MOS transistor design, process, reliability and manufacturing. Icsict 1 (2001) 1-15. http://ieeexplore.ieee.org/xpl/tocresult.jsp?isnumber=21144&isYear=2 001
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Icsict
, vol.1
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Sah, C.-T.1
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3
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0029379026
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Direct current measurements of oxide and interface traps on oxidized silicon
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Neugroschel A., Sah C.-T., et al. Direct current measurements of oxide and interface traps on oxidized silicon. IEEE Trans Electron Dev 42 (1995) 1657-1662
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(1995)
IEEE Trans Electron Dev
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Neugroschel, A.1
Sah, C.-T.2
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5
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0031561281
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Linear reduction of drain current with increasing interface recombination in nMOS transistors stressed by channel hot electrons
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Han K.M., and Sah C.-T. Linear reduction of drain current with increasing interface recombination in nMOS transistors stressed by channel hot electrons. Electron Lett 33 (1997) 1821-1822
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(1997)
Electron Lett
, vol.33
, pp. 1821-1822
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Han, K.M.1
Sah, C.-T.2
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6
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0031648935
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Current accelerated channel hot carrier stress of MOS transistors
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Sah C.-T., Neugroschel A., and Han K M. Current accelerated channel hot carrier stress of MOS transistors. Electron Lett 34 (1998) 217-218
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(1998)
Electron Lett
, vol.34
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Sah, C.-T.1
Neugroschel, A.2
Han K, M.3
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7
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33750409250
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Reliability of transistors with low-K materials
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Sah C.-T. Reliability of transistors with low-K materials. Mater Res Soc Proc 13 (1998) 301-308
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(1998)
Mater Res Soc Proc
, vol.13
, pp. 301-308
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Sah, C.-T.1
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8
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0032121870
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Positive oxide charge from hot hole injection during channel-hot-electron stress
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Han K.M., and Sah C.-T. Positive oxide charge from hot hole injection during channel-hot-electron stress. IEEE Trans Electron Dev 45 (1998) 1624-1627
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(1998)
IEEE Trans Electron Dev
, vol.45
, pp. 1624-1627
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Han, K.M.1
Sah, C.-T.2
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9
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0032670487
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Interconnect and MOS transistor degradation at high current densities
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Neugroschel A., and Sah C.-T. Interconnect and MOS transistor degradation at high current densities. Proc Int Reliab Phys Symp (1999) 30-36
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(1999)
Proc Int Reliab Phys Symp
, pp. 30-36
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Neugroschel, A.1
Sah, C.-T.2
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10
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33750388160
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Sah C-T. DCIV Monitor for Diagnosis of Sub-Quarter-Micron Technology. Report No. C98333, Semiconductor Research Corp. 1998.
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11
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33750406953
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Sah C-T. DCIV Method Does Work for Thin Tunneling Gate Oxides. Report No. C99428, Semiconductor Research Corp. 1999.
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12
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33750384785
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Sah C-T. DCIV Diagnosis of a Tunneling Thin Gate Oxide CMOS Technology. Report No. C99429, Semiconductor Research Corp. 1999.
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13
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0002840375
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Monitoring interface traps by DCIV method
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Cai J., and Sah C.-T. Monitoring interface traps by DCIV method. IEEE Electron Dev Lett 20 (1999) 60-63
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(1999)
IEEE Electron Dev Lett
, vol.20
, pp. 60-63
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Cai, J.1
Sah, C.-T.2
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14
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0003327430
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Evidence of discrete interface traps on thermally grown thin silicon oxide films
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Cai J., and Sah C.-T. Evidence of discrete interface traps on thermally grown thin silicon oxide films. Appl Phys Lett 74 (1999) 257-259
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(1999)
Appl Phys Lett
, vol.74
, pp. 257-259
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Cai, J.1
Sah, C.-T.2
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15
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0033889077
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Interfacial electronic traps in surface controlled transistors
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Cai J., and Sah C.-T. Interfacial electronic traps in surface controlled transistors. IEEE Trans Electron Dev 47 (2000) 576-583
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(2000)
IEEE Trans Electron Dev
, vol.47
, pp. 576-583
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Cai, J.1
Sah, C.-T.2
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16
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0035339725
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Analysis of the DCIV peaks in electrically stressed pMOSFETs
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Jie B.B., Chim W.K., Li M.-F., and Lo K.F. Analysis of the DCIV peaks in electrically stressed pMOSFETs. IEEE Trans Electron Dev 48 5 (2001) 913-920
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IEEE Trans Electron Dev
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Jie, B.B.1
Chim, W.K.2
Li, M.-F.3
Lo, K.F.4
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17
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84927553170
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Carrier generation and recombination in p-n junctions and p-n junction characteristics
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Sah C.-T., Noyce R.N., and Shockley W. Carrier generation and recombination in p-n junctions and p-n junction characteristics. Proc IRE 45 (1957) 1228-1243
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(1957)
Proc IRE
, vol.45
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Sah, C.-T.1
Noyce, R.N.2
Shockley, W.3
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18
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0035444560
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Temperature dependence of surface recombination current in MOS transistors
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Wang Y., Neugroschel A., and Sah C.-T. Temperature dependence of surface recombination current in MOS transistors. IEEE Trans Electron Dev 48 (2001) 2095-2101
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(2001)
IEEE Trans Electron Dev
, vol.48
, pp. 2095-2101
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Wang, Y.1
Neugroschel, A.2
Sah, C.-T.3
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19
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84930556245
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The effects of fixed bulk charge on the characteristics of metal-oxide-semiconductor transistor
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Sah C.-T., and Pao H. The effects of fixed bulk charge on the characteristics of metal-oxide-semiconductor transistor. IEEE Trans Electron Dev 13 (1966) 393-409
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(1966)
IEEE Trans Electron Dev
, vol.13
, pp. 393-409
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Sah, C.-T.1
Pao, H.2
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20
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33750421150
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Sah C-T.A History of MOS Transistor Compact Modeling. Technical Proceedings Workshop on Compact Modeling (WCM) 2005; 349-390. http://www.nsti.org/procs/Nanotech2005WCM/5/X99.01.
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22
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33750414552
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Sah C-T, Chen Z and Jie B B. Effects of energy distribution of interface traps on recombination DC current-voltage lineshape. In: Meeting Bulletin of the 72nd Annual Meeting of the Southeastern Section of the American Physical Society (SESAPS 2005); p. 34.
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23
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84937647715
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A new semiconductor tetrode, the surface potential controlled transistor
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Sah C.-T. A new semiconductor tetrode, the surface potential controlled transistor. Proc IRE 49 (1961) 1623-1634
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(1961)
Proc IRE
, vol.49
, pp. 1623-1634
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Sah, C.-T.1
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24
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84918052986
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Effects of surface recombination and channel on p-n junction and transistor characteristics
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Sah C.-T. Effects of surface recombination and channel on p-n junction and transistor characteristics. IRE Trans Electron Dev 9 (1962) 94-108
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(1962)
IRE Trans Electron Dev
, vol.9
, pp. 94-108
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Sah, C.-T.1
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25
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31644451937
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Theoretical accuracy of using Boltzmann and ionized-impurity approximation in the analysis of recombination current at interface traps in metal-oxide-silicon structures
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Chen Z., Jie B.B., and Sah C.-T. Theoretical accuracy of using Boltzmann and ionized-impurity approximation in the analysis of recombination current at interface traps in metal-oxide-silicon structures. J Appl Phys 99 (2006) 024502-024512
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(2006)
J Appl Phys
, vol.99
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Chen, Z.1
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Sah, C.-T.3
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