Interconnect and MOS transistor degradation at high current densities

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1999, Pages 30-36

  Neugroschel, Arnost ^a   Sah, Chih Tang ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DEGRADATION; DIFFUSION; HYDROGEN BONDS; INTERFACES (MATERIALS); KINETIC THEORY; REDUCTION; RELIABILITY; SEMICONDUCTING SILICON; SILICA; THERMAL EFFECTS;

INTERFACE TRAPS; METAL CONTACT; METAL HYDROGEN BOND BREAKING; METAL INTERCONNECT LINES;

MOSFET DEVICES;

EID: 0032670487     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (8)