Ultrathin poly(ethylene glycol) monolayers formed by chemical vapor deposition on silicon substrates

Journal of Nanoscience and Nanotechnology

Volumn 6, Issue 6, 2006, Pages 1695-1700

  Shirahata, Naoto ^a   Hozumi, Atsushi ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

potential; 2 (methoxy polyethyleneoxy propyl)trimethoxysilane; Chemical Vapor Deposition; Lateral force Microscopy; Monolayer; Poly(ethylene glycol); Solid Vapor interface

Indexed keywords

AMINOTERMINATED SURFACES; LATERAL FORCE MICROSCOPY; ORGANOSILANES; VAPOR INTERFACES;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; HYDROPHOBICITY; MICROSTRUCTURE; PHOTOLITHOGRAPHY; POLYETHYLENE GLYCOLS; SILICON;

MONOLAYERS;

GOLD; MACROGOL DERIVATIVE; SILANE DERIVATIVE; SILICON;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; PH; PHOTOCHEMISTRY; SPECTROSCOPY; SURFACE PROPERTY; X RAY;

ADSORPTION; GOLD; HYDROGEN-ION CONCENTRATION; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; PHOTOCHEMISTRY; POLYETHYLENE GLYCOLS; SILANES; SILICON; SPECTRUM ANALYSIS; SURFACE PROPERTIES; X-RAYS;

EID: 33750172887     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2006.238     Document Type: Article

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