Regulation of the surface potential of silicon substrates in micrometer scale with organosilane self-assembled monolayers

Langmuir

Volumn 18, Issue 20, 2002, Pages 7469-7472

  Hayashi, Kazuyuki ^a   Saito, Nagahiro ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a   Nakagiri, Nobuyuki ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Nikon C/O   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; MONOLAYERS; PHOTOLITHOGRAPHY; SILICON; THIN FILMS; ULTRAHIGH VACUUM;

KELVIN PROBE FORCE MICROSCOPY (KPM); MOLECULAR ORBITALS (MO); SCANNING PROBE MICROSCOPY (SPM);

SELF ASSEMBLY;

EID: 0036813552     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la011707h     Document Type: Article

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