Comparative study of HfN x and Hf-Ge-N copper diffusion barriers on Ge

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Rawal, S ^a   Lambers, E ^a   Norton, D P ^a   Anderson, T J ^a   McElwee White, L ^b  

^a University of Florida   (United States)

^b NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; BARRIER MATERIALS; DIFFUSION BARRIERS; FILM STRUCTURES;

ANNEALING; COPPER; DIFFUSION; GERMANIUM; METALLIZING; X RAY DIFFRACTION;

HAFNIUM COMPOUNDS;

EID: 33749369548     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2349470     Document Type: Article

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