-
1
-
-
0346955939
-
"Defects in epitaxial multilayers-I: Misfit dislocations in layers,"
-
vol. 27, pp. 118-125, 1974.
-
J. W. Matthews and A. E. Blakeslee, "Defects in epitaxial multilayers-I: Misfit dislocations in layers," J. Crystal Growth, vol. 27, pp. 118-125, 1974.
-
J. Crystal Growth
-
-
Matthews, J.W.1
Blakeslee, A.E.2
-
2
-
-
33744558557
-
"Defects in epitaxial multilayers-II: Dislocation pile-ups, threading dislocations, slip lines and cracks,"
-
vol. 32, pp. 265-273, 1975.
-
_, "Defects in epitaxial multilayers-II: Dislocation pile-ups, threading dislocations, slip lines and cracks," J. Crystal Growth, vol. 32, pp. 265-273, 1975.
-
J. Crystal Growth
-
-
-
3
-
-
0001464737
-
"The thermal stability of SiGe films deposited by ultrahighvacuum chemical vapor deposition,"
-
vol. 70, pp. 1416-1420, 1991. See also, "Erratum," J. Appl. Phys., vol. 70, p. 7194, 1991.
-
S. R. Stiffler, J. H. Comfort, C. L. Stanis, D. L. Harame, and E. de Frésart, "The thermal stability of SiGe films deposited by ultrahighvacuum chemical vapor deposition," J. Appl. Phys., vol. 70, pp. 1416-1420, 1991. See also, "Erratum," J. Appl. Phys., vol. 70, p. 7194, 1991.
-
J. Appl. Phys.
-
-
Stiffler, S.R.1
Comfort, J.H.2
Stanis, C.L.3
Harame, D.L.4
De Frésart, E.5
-
4
-
-
0023573563
-
"Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy,"
-
1987, pp. 874-876.
-
S. S. lyer, G. L. Patton, S. L. Delage, S. Tiwari, and J. M. C. Stork, "Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy," Tech. Dig. Int. Electron Device Meeting, 1987, pp. 874-876.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Lyer, S.S.1
Patton, G.L.2
Delage, S.L.3
Tiwari, S.4
Stork, J.M.C.5
-
5
-
-
0023994622
-
"Silicon-germanium-base heterojunction bipolar transistors by molecular beam epitaxy,"
-
vol. 9, pp. 165-167, Apr. 1988.
-
G. L. Patton, S. S. lyer, S. L. Delage, S. Tiwari, and J. M. C. Stork, "Silicon-germanium-base heterojunction bipolar transistors by molecular beam epitaxy," IEEE Electron Device Lett., vol. 9, pp. 165-167, Apr. 1988.
-
IEEE Electron Device Lett.
-
-
Patton, G.L.1
Lyer, S.S.2
Delage, S.L.3
Tiwari, S.4
Stork, J.M.C.5
-
6
-
-
0025419030
-
"75 GHz
-
vol. 11, pp. 171-173, Apr. 1990.
-
G. L. Patton, J. H. Comfort, B. S. Meyerson, E. F. Crabbé, G. J. Scilla, E. de Fresart, J. M. C. Stork, J. Y.-C. Sun, D. L. Harame, and J. Burghartz, "75 GHz ff SiGe base heterojunction bipolar transistors," IEEE Electron Device Lett., vol. 11, pp. 171-173, Apr. 1990.
-
Ff SiGe Base Heterojunction Bipolar Transistors," IEEE Electron Device Lett.
-
-
Patton, G.L.1
Comfort, J.H.2
Meyerson, B.S.3
Crabbé, E.F.4
Scilla, G.J.5
De Fresart, E.6
Stork, J.M.C.7
Sun, J.Y.-C.8
Harame, D.L.9
Burghartz, J.10
-
7
-
-
0025577369
-
"Profile leverage in a self-aligned epitaxial Si or SiGe-base bipolar technology,"
-
1990, pp. 21-24.
-
J. H. Comfort, G. L. Patton, J. D. Cressler, W. Lee, E. F. Crabbé, B. S. Meyerson, J. Y.-C. Sun, J. M. C. Stork, P.-F. Lu, J. N. Burghartz, J. Warnock, K. Kenkins, K.-Y. Toh, M. D'Agostino, and G. Scilla, "Profile leverage in a self-aligned epitaxial Si or SiGe-base bipolar technology," Tech. Dig. Int. Electron Device Meeting, 1990, pp. 21-24.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Comfort, J.H.1
Patton, G.L.2
Cressler, J.D.3
Lee, W.4
Crabbé, E.F.5
Meyerson, B.S.6
Sun, J.Y.-C.7
Stork, J.M.C.8
Lu, P.-F.9
Burghartz, J.N.10
Warnock, J.11
Kenkins, K.12
Toh, K.-Y.13
D'Agostino, M.14
Scilla, G.15
-
8
-
-
85056943935
-
"A high-performance epitaxial SiGebase ECL BiCMOS technology,"
-
1992, pp. 19-22.
-
D. L. Harame, E. F. Crabbé, J. D. Cressler, J. H. Comfort, J. Y.C. Sun, S. R. Stiffler, E. Kobeda, J. N. Burghartz, M. M. Gilbert, J. Malinowski, and A. J. Dally, "A high-performance epitaxial SiGebase ECL BiCMOS technology," Tech. Dig. Int. Electron Device Meeting, 1992, pp. 19-22.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Harame, D.L.1
Crabbé, E.F.2
Cressler, J.D.3
Comfort, J.H.4
Sun, J.Y.C.5
Stiffler, S.R.6
Kobeda, E.7
Burghartz, J.N.8
Gilbert, M.M.9
Malinowski, J.10
Dally, A.J.11
-
9
-
-
0027877999
-
"Optimization of SiGe HBT technology for high speed analog and mixed-signal applications,"
-
1993, pp. 71-74.
-
D. L. Harame, J. M. C. Stork, B. S. Meyerson, K. Y.-J. Hsu, J. Cotte, K. A. Jenkins, J. D. Cressler, P. Restle, E. F. Crabbé, S. Subbanna, T. E. Tice, B. W. Scharf, and J. A. Yasaitis, "Optimization of SiGe HBT technology for high speed analog and mixed-signal applications," Tech. Dig. Int. Electron Device Meeting, 1993, pp. 71-74.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Harame, D.L.1
Stork, J.M.C.2
Meyerson, B.S.3
Hsu, K.Y.-J.4
Cotte, J.5
Jenkins, K.A.6
Cressler, J.D.7
Restle, P.8
Crabbé, E.F.9
Subbanna, S.10
Tice, T.E.11
Scharf, B.W.12
Yasaitis, J.A.13
-
10
-
-
0027815541
-
"High speed SiGe-HBT with very low base sheet resistivity,"
-
1993, pp. 79-81.
-
E. Kasper, A. Gruhle, and H. Kibbel, "High speed SiGe-HBT with very low base sheet resistivity," Tech. Dig. Int. Electron Device Meeting, 1993, pp. 79-81.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Kasper, E.1
Gruhle, A.2
Kibbel, H.3
-
11
-
-
0027889053
-
"Vertical profile optimization of very high frequency epitaxial Siand SiGe-base bipolar transistors,"
-
1993, pp. 83-86.
-
E. F. Crabbé, B. S. Meyerson, J. M. C. Stork, and D. L. Harame, "Vertical profile optimization of very high frequency epitaxial Siand SiGe-base bipolar transistors," Tech. Dig. Int. Electron Device Meeting, 1993, pp. 83-86.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Crabbé, E.F.1
Meyerson, B.S.2
Stork, J.M.C.3
Harame, D.L.4
-
12
-
-
0028737683
-
max up to 120 GHz,"
-
1994, pp. 377-380.
-
max up to 120 GHz," Tech. Dig. Int. Electron Device Meeting, 1994, pp. 377-380.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Schuppen, A.1
Gruhle, A.2
Erben, U.3
Kibbel, H.4
Konig, U.5
-
13
-
-
18544395232
-
"A 200 mm SiGe-HBT technology for wireless and mixedsignal applications,"
-
1994, pp. 437-40.
-
D. L. Harame, K. Schonenberg, M. Gilbert, D. Nguyen-Ngoc, J. Malinowski, S.-J. Jeng, B. S. Meyerson, J. D. Cressler, R. Groves, G. Berg, K. Tallman, K. Stein, G. Hueckel, C. Kermarrec, T. Tice, G. Fitzgibbons, K. Walter, D. Colavito, T. Houghton, N. Greco, T. Kebede, B. Cunningham, S. Subbanna, J. H. Comfort, and E. F. Crabbé, "A 200 mm SiGe-HBT technology for wireless and mixedsignal applications," Tech. Dig. Int. Electron Device Meeting, 1994, pp. 437-40.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Harame, D.L.1
Schonenberg, K.2
Gilbert, M.3
Nguyen-Ngoc, D.4
Malinowski, J.5
Jeng, S.-J.6
Meyerson, B.S.7
Cressler, J.D.8
Groves, R.9
Berg, G.10
Tallman, K.11
Stein, K.12
Hueckel, G.13
Kermarrec, C.14
Tice, T.15
Fitzgibbons, G.16
Walter, K.17
Colavito, D.18
Houghton, T.19
Greco, N.20
Kebede, T.21
Cunningham, B.22
Subbanna, S.23
Comfort, J.H.24
Crabbé, E.F.25
more..
-
14
-
-
0024611641
-
-
vol. 10, pp. 52-54, Feb. 1989.
-
C. A. King, J. L. Hoyt, C. M. Gronet, J. F. Gibbons, M. P. Scott, and J. Turner, "Si/Sii-x/Gex heterojunction bipolar transistors produced by limited reaction processing," IEEE Electron Device Lett., vol. 10, pp. 52-54, Feb. 1989.
-
"Si/Sii-x/Gex Heterojunction Bipolar Transistors Produced by Limited Reaction Processing," IEEE Electron Device Lett.
-
-
King, C.A.1
Hoyt, J.L.2
Gronet, C.M.3
Gibbons, J.F.4
Scott, M.P.5
Turner, J.6
-
15
-
-
0025577330
-
"Sub-30 ps ECL circuits using high
-
1990, pp. 297-300.
-
J. N. Burghartz, J. H. Comfort, G. L. Patton, J. D. Cressler, B. S. Meyerson, J. M. C. Stork, J. Y.-C. Sun, G. Scilla, J. Warnock, K. Jenkins, K.-Y. Toh, D. L. Harame, and S. R. Mader, "Sub-30 ps ECL circuits using high }T Si and SiGe epitaxial SEEW transistors," in Tech. Dig. Int. Electron Device Meeting, 1990, pp. 297-300.
-
}T Si and SiGe Epitaxial SEEW Transistors," in Tech. Dig. Int. Electron Device Meeting
-
-
Burghartz, J.N.1
Comfort, J.H.2
Patton, G.L.3
Cressler, J.D.4
Meyerson, B.S.5
Stork, J.M.C.6
Sun, J.Y.-C.7
Scilla, G.8
Warnock, J.9
Jenkins, K.10
Toh, K.-Y.11
Harame, D.L.12
Mader, S.R.13
-
16
-
-
84936896141
-
"Single crystal emitter cap for epitaxial Si- And SiGe base transistors,"
-
1991, pp. 857-860.
-
J. H. Comfort, E. F. Crabbé, J. D. Cressler, W. Lee, J. Y.-C. Sun, J. Malinowski, M. D-Agostino, J. N. Burghartz, J. M. C. Stork, and B. S. Meyerson, "Single crystal emitter cap for epitaxial Si- and SiGe base transistors," Tech. Dig. Int. Electron Device Meeting, 1991, pp. 857-860.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Comfort, J.H.1
Crabbé, E.F.2
Cressler, J.D.3
Lee, W.4
Sun, J.Y.-C.5
Malinowski, J.6
D-Agostino, M.7
Burghartz, J.N.8
Stork, J.M.C.9
Meyerson, B.S.10
-
17
-
-
0026851318
-
"MBE-grown Si/SiGe HBT s with high β
-
vol. 13, pp. 206-208, Apr. 1992.
-
max," IEEE Electron Device Lett., vol. 13, pp. 206-208, Apr. 1992.
-
max," IEEE Electron Device Lett.
-
-
Gruhle, A.1
Kibbel, H.2
König, U.3
Erben, U.4
Kasper, E.5
-
18
-
-
0027685282
-
"High-low polysilicon-emitter SiGe-base bipolar transistors,"
-
vol. 14, pp. 478-180, Oct. 1993.
-
E. F. Crabbé, J. H. Comfort, J. D. Cressler, J. Y.-C. Sun, and J. M. C. Stork, "High-low polysilicon-emitter SiGe-base bipolar transistors," IEEE Electron Device Lett., vol. 14, pp. 478-180, Oct. 1993.
-
IEEE Electron Device Lett.
-
-
Crabbé, E.F.1
Comfort, J.H.2
Cressler, J.D.3
Sun, J.Y.-C.4
Stork, J.M.C.5
-
19
-
-
0027656861
-
"High-performance epitaxial base bipolar transistors produced by a reduced-pressure CVD reactor,"
-
vol. 14, pp. 450-152, Sept. 1993.
-
M. Hong, E. de Fresart, J. Steele, A. Zlotnicka, C. Stein, G. Tarn, M. Racanelli, L. Knoch, Y. C. See, and K. Evans, "High-performance epitaxial base bipolar transistors produced by a reduced-pressure CVD reactor," IEEE Electron Device Lett., vol. 14, pp. 450-152, Sept. 1993.
-
IEEE Electron Device Lett.
-
-
Hong, M.1
De Fresart, E.2
Steele, J.3
Zlotnicka, A.4
Stein, C.5
Tarn, G.6
Racanelli, M.7
Knoch, L.8
See, Y.C.9
Evans, K.10
-
20
-
-
0029536454
-
"SiGe HBT technology: Device and application issues,"
-
1995, pp. 731-734.
-
D. Harame, L. Larson, M. Case, K. Kovacic, S. Voinigescu, T. Tewksbury, D. Nguyen-Ngoc, K. Stein, J. D. Cressler, S.-J. Jeng, J. Malinowski, R. Groves, E. Eld, D. Sunderland, D. Rensch, M. Gilbert, K. Schonenberg, D. Ahlgren, S. Rosenbaum, J. Glenn, and B. Meyerson, "SiGe HBT technology: Device and application issues," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 731-734.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Harame, D.1
Larson, L.2
Case, M.3
Kovacic, K.4
Voinigescu, S.5
Tewksbury, T.6
Nguyen-Ngoc, D.7
Stein, K.8
Cressler, J.D.9
Jeng, S.-J.10
Malinowski, J.11
Groves, R.12
Eld, E.13
Sunderland, D.14
Rensch, D.15
Gilbert, M.16
Schonenberg, K.17
Ahlgren, D.18
Rosenbaum, S.19
Glenn, J.20
Meyerson, B.21
more..
-
21
-
-
0029532542
-
"A self-aligned SiGe base bipolar technology using cold wall UHV/CVD and its application for optical communications IC's,"
-
1995, pp. 82-88.
-
F. Sato, T. Hashimoto, T. Tatsumi, M. Soda, H. Tezuka, T. Sazaki, and T. Tashiro, "A self-aligned SiGe base bipolar technology using cold wall UHV/CVD and its application for optical communications IC's," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 82-88.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Sato, F.1
Hashimoto, T.2
Tatsumi, T.3
Soda, M.4
Tezuka, H.5
Sazaki, T.6
Tashiro, T.7
-
22
-
-
18144436643
-
"SiGe base bipolar technology with 74 GHz /max and 11 ps gate delay,"
-
1995, pp. 739-742.
-
T. Meister, H. Schäfer, M. Franosch, W. Molzer, K. Aufinger, U. Scheler, C. Walz, M. Stolz, S. Boguth, and J. Bock, "SiGe base bipolar technology with 74 GHz /max and 11 ps gate delay," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 739-742.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Meister, T.1
Schäfer, H.2
Franosch, M.3
Molzer, W.4
Aufinger, K.5
Scheler, U.6
Walz, C.7
Stolz, M.8
Boguth, S.9
Bock, J.10
-
23
-
-
0029536345
-
"Selective-epitaxial base technology with 14 ps ECL-gate delay for low power wide-band communications systems,"
-
1995, pp. 747-750.
-
A. Pruijmboom, D. Terpstra, C. Timmering, W. deBoer, M. Theunissen, J. Slotboom, R. Hueting, and J. Hageraats, "Selective-epitaxial base technology with 14 ps ECL-gate delay for low power wide-band communications systems," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 747-750.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Pruijmboom, A.1
Terpstra, D.2
Timmering, C.3
Deboer, W.4
Theunissen, M.5
Slotboom, J.6
Hueting, R.7
Hageraats, J.8
-
24
-
-
0029492060
-
"Si/GeSi HBT's with GeSi base formed by high dose Ge implantation into Si,"
-
1995, pp. 1019-1021.
-
S. Lombardo, A. Pinto, A. Raineri, P. Ward, and S. Campisano, "Si/GeSi HBT's with GeSi base formed by high dose Ge implantation into Si," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 1019-1021.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Lombardo, S.1
Pinto, A.2
Raineri, A.3
Ward, P.4
Campisano, S.5
-
25
-
-
0030412794
-
"Manufacturability demonstration of an integrated SiGe HBT technology for the analog and wireless marketplace,"
-
1996, pp. 859-862.
-
D. Ahlgren, M. Gilbert, D. Greenberg, S.-J. Jeng, J. Malinowski, D. Nguyen-Ngoc, K. Schonenberg, K. Stein, D. Sunderland, R. Groves, K. Walter, G. Hueckel, D. Colavito, G. Freeman, D. Harame, and B. Meyerson, "Manufacturability demonstration of an integrated SiGe HBT technology for the analog and wireless marketplace," Tech. Dig. Int. Electron Device Meeting, 1996, pp. 859-862.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Ahlgren, D.1
Gilbert, M.2
Greenberg, D.3
Jeng, S.-J.4
Malinowski, J.5
Nguyen-Ngoc, D.6
Schonenberg, K.7
Stein, K.8
Sunderland, D.9
Groves, R.10
Walter, K.11
Hueckel, G.12
Colavito, D.13
Freeman, G.14
Harame, D.15
Meyerson, B.16
-
26
-
-
0030398649
-
"SiGe technology and components for mobile communications systems,"
-
1996, pp. 130-133.
-
A. Schuppen, H. Dietrich, S. Gerlach, and J. Arndt, "SiGe technology and components for mobile communications systems," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1996, pp. 130-133.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Schuppen, A.1
Dietrich, H.2
Gerlach, S.3
Arndt, J.4
-
27
-
-
0030413570
-
"Sub-10 fJ ECL/68 //A 4.7 GHz divider ultra-low-power SiGe base bipolar transistors with a wedge-shaped CVD-S1O2 isolation structure and a BPSG-refilled trench,"
-
1996, pp. 245-248.
-
M. Kondo, K. Oda, E. Ohue, H. Shimamoto, M. Tanabe, T. Onai, and K. Washio, "Sub-10 fJ ECL/68 //A 4.7 GHz divider ultra-low-power SiGe base bipolar transistors with a wedge-shaped CVD-S1O2 isolation structure and a BPSG-refilled trench," Tech. Dig. Int. Electron Device Meeting, 1996, pp. 245-248.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Kondo, M.1
Oda, K.2
Ohue, E.3
Shimamoto, H.4
Tanabe, M.5
Onai, T.6
Washio, K.7
-
28
-
-
0031353281
-
"A SiGe HBT BiCMOS technology for mixed-signal RF applications,"
-
1997, pp. 195-197.
-
D. Ahlgren, G. Freeman, S. Subbanna, R. Groves, D. Greenberg, J. Malinowski, D. Nguyen-Ngoc, S. Jeng, K. Stein, K. Schonenberg, D. Kiesling, B. Martin, S. Wu, D. Harame, and Meyerson, "A SiGe HBT BiCMOS technology for mixed-signal RF applications," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1997, pp. 195-197.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Ahlgren, D.1
Freeman, G.2
Subbanna, S.3
Groves, R.4
Greenberg, D.5
Malinowski, J.6
Nguyen-Ngoc, D.7
Jeng, S.8
Stein, K.9
Schonenberg, K.10
Kiesling, D.11
Martin, B.12
Wu, S.13
Harame, D.14
Meyerson15
-
29
-
-
0031339257
-
"Design of RF integrated circuits using SiGe bipolar technology,"
-
1997, pp. 51-56.
-
R. Götzfried, F. Beiswanger, and S. Gerlach, "Design of RF integrated circuits using SiGe bipolar technology," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1997, pp. 51-56.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Götzfried, R.1
Beiswanger, F.2
Gerlach, S.3
-
30
-
-
0031071440
-
"Integration of SiGe heterojunction bipolar transistors in a 200 mm industrial BiCMOS technology,"
-
vol. 294, pp. 250-253, 1997.
-
E. de Berranger, S. Brodnar, A. Chantre, J. Kirtsch, A. Monroy, A. Granier, M. Laurens, J. L. Regolini, and M. Moulis, "Integration of SiGe heterojunction bipolar transistors in a 200 mm industrial BiCMOS technology," Thin Solid Films, vol. 294, pp. 250-253, 1997.
-
Thin Solid Films
-
-
De Berranger, E.1
Brodnar, S.2
Chantre, A.3
Kirtsch, J.4
Monroy, A.5
Granier, A.6
Laurens, M.7
Regolini, J.L.8
Moulis, M.9
-
31
-
-
0031710316
-
"95 GHz
-
K. Washio, E. Ohue, K. Oda, M. Tanabe, H. Shimamoto, and T. Onai, "95 GHz }T self-aligned selective-epitaxial SiGe HBT's with SMI electrodes," presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
}T Self-aligned Selective-epitaxial SiGe HBT's with SMI Electrodes," Presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
-
Washio, K.1
Ohue, E.2
Oda, K.3
Tanabe, M.4
Shimamoto, H.5
Onai, T.6
-
32
-
-
0028056578
-
"Si-analog IC's for 20 Gb/s optical receiver,"
-
1994, pp. 170-171.
-
M. Soda, H. Tezuka, F. Sato, T. Hashimoto, S. Nakamura, T. Tatsumi, and T. Tashiro, "Si-analog IC's for 20 Gb/s optical receiver," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1994, pp. 170-171.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Soda, M.1
Tezuka, H.2
Sato, F.3
Hashimoto, T.4
Nakamura, S.5
Tatsumi, T.6
Tashiro, T.7
-
33
-
-
0028743827
-
"SiGe bipolar IC's for a 20 Gb/s optical transmitter,"
-
1994, pp. 167-170.
-
T. Hashimoto, F. Sato, M. Soda, H. Tezuka, T. Suzuki, T. Tatsumi, and T. Tashiro, "SiGe bipolar IC's for a 20 Gb/s optical transmitter," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1994, pp. 167-170.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Hashimoto, T.1
Sato, F.2
Soda, M.3
Tezuka, H.4
Suzuki, T.5
Tatsumi, T.6
Tashiro, T.7
-
34
-
-
0029271461
-
"Sub-20 ps ECL circuits with high-performance super self-aligned selectively grown SiGe base (SSSB) bipolar transistors,"
-
vol. 42, pp. 483-88, Mar. 1995.
-
F. Sato, T. Hashimoto, T. Tatsumi, and T. Tashiro, "Sub-20 ps ECL circuits with high-performance super self-aligned selectively grown SiGe base (SSSB) bipolar transistors," IEEE Trans. Electron Devices, vol. 42, pp. 483-88, Mar. 1995.
-
IEEE Trans. Electron Devices
-
-
Sato, F.1
Hashimoto, T.2
Tatsumi, T.3
Tashiro, T.4
-
35
-
-
0029486673
-
"A 23 GHz static 1/128 frequency divider implemented in a manufacturable Si/SiGe HBT process,"
-
1995, pp. 121-123.
-
M. Case, L. Larson, D. Rensch, S. Rosenbaum, S. Knorr, D. Harame, and B. Meyerson, "A 23 GHz static 1/128 frequency divider implemented in a manufacturable Si/SiGe HBT process," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 121-123.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Case, M.1
Larson, L.2
Rensch, D.3
Rosenbaum, S.4
Knorr, S.5
Harame, D.6
Meyerson, B.7
-
36
-
-
0029543378
-
"A 5-GHz SiGe HBT return-to-zero comparator,"
-
1995, pp. 166-169.
-
W. Gao, W. Snelgrove, T. Varelas, S. Kovacic, and D. Harame, "A 5-GHz SiGe HBT return-to-zero comparator," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 166-169.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Gao, W.1
Snelgrove, W.2
Varelas, T.3
Kovacic, S.4
Harame, D.5
-
37
-
-
0029532224
-
"12-GHz Gilbert mixers using a manufacturable Si/SiGe epitaxial-base bipolar technology,"
-
1995, pp. 186-189.
-
J. Glenn, R. Poisson, M. Case, D. Harame, and B. Meyerson, "12-GHz Gilbert mixers using a manufacturable Si/SiGe epitaxial-base bipolar technology," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 186-189.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Glenn, J.1
Poisson, R.2
Case, M.3
Harame, D.4
Meyerson, B.5
-
38
-
-
0029514179
-
"A 3 V supply voltage, DC-18 GHz SiGe HBT wide-band amplifier,"
-
1995, pp. 190-193.
-
H. Schumacher, U. Erben, A. Gruhle, H. Kibbel, and U. König, "A 3 V supply voltage, DC-18 GHz SiGe HBT wide-band amplifier," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 190-193.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Schumacher, H.1
Erben, U.2
Gruhle, A.3
Kibbel, H.4
König, U.5
-
39
-
-
0029490101
-
"Monolithic 26 GHz and 40 GHz VCO's with SiGe heterojunction bipolar transistors,"
-
1995, pp. 725-728.
-
A. Gruhle, A. Schuppen, U. König, U. Erben, and H. Schumacher, "Monolithic 26 GHz and 40 GHz VCO's with SiGe heterojunction bipolar transistors," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 725-728.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Gruhle, A.1
Schuppen, A.2
König, U.3
Erben, U.4
Schumacher, H.5
-
40
-
-
0029483388
-
"The optical terminal 1C: A 2.4 Gb/s receiver and a 1:16 demultiplexer in one chip,"
-
1995, pp. 162-165.
-
F. Sato, H. Tezuka, M. Soda, T. Hashimoto, T. Suzaki, T. Tatsumi, T. Morikawa, and T. Tashiro, "The optical terminal 1C: A 2.4 Gb/s receiver and a 1:16 demultiplexer in one chip," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 162-165.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Sato, F.1
Tezuka, H.2
Soda, M.3
Hashimoto, T.4
Suzaki, T.5
Tatsumi, T.6
Morikawa, T.7
Tashiro, T.8
-
41
-
-
0030086653
-
"Si/SiGe HBT technology for low-cost monolithic microwave integrated circuits,"
-
1996, pp. 80-81.
-
L. Larson, M. Case, S. Rosenbaum, D. Rensch, P. MacDonald, M. Matloubian, M. Chen, D. Harame, J. Malinowski, B. Meyerson, M. Gilbert, and S. Maas, "Si/SiGe HBT technology for low-cost monolithic microwave integrated circuits," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1996, pp. 80-81.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Larson, L.1
Case, M.2
Rosenbaum, S.3
Rensch, D.4
MacDonald, P.5
Matloubian, M.6
Chen, M.7
Harame, D.8
Malinowski, J.9
Meyerson, B.10
Gilbert, M.11
Maas, S.12
-
42
-
-
0030270725
-
"A 2.4 Gb/s receiver and a 1:16 demultiplexer in one chip using a super self-aligned selectively grown SiGe base (SSSB) bipolar transistor,"
-
vol. 1451-1457, Oct. 1996.
-
F. Sato, H. Tezuka, M. Soda, T. Hashimoto, T. Suzaki, T. Tatsumi, T. Morikawa, and T. Tashiro, "A 2.4 Gb/s receiver and a 1:16 demultiplexer in one chip using a super self-aligned selectively grown SiGe base (SSSB) bipolar transistor," IEEE J. Solid-State Circuits, vol. 1451-1457, Oct. 1996.
-
IEEE J. Solid-State Circuits
-
-
Sato, F.1
Tezuka, H.2
Soda, M.3
Hashimoto, T.4
Suzaki, T.5
Tatsumi, T.6
Morikawa, T.7
Tashiro, T.8
-
43
-
-
0030403813
-
"An 11 GHz 3 V SiGe voltage-controlled oscillator with integrated resonator,"
-
1996, pp. 169-1172.
-
M. Soyuer, J. Burghartz, H. Ainspan, K. Jenkins, P. Xiao, A. Shahani, M. Dolan, and D. Harame, "An 11 GHz 3 V SiGe voltage-controlled oscillator with integrated resonator," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1996, pp. 169-1172.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Soyuer, M.1
Burghartz, J.2
Ainspan, H.3
Jenkins, K.4
Xiao, P.5
Shahani, A.6
Dolan, M.7
Harame, D.8
-
44
-
-
0029710296
-
"Zero power consumption Si/SiGe HBT SPOT T/R antenna switch,"
-
1996, pp. 651-653.
-
R. Götzfried, T. Itoh, J. F. Luy, and H. Schumacher, "Zero power consumption Si/SiGe HBT SPOT T/R antenna switch," Tech. Dig. IEEE MTTS Int. Microwave Symp., 1996, pp. 651-653.
-
Tech. Dig. IEEE MTTS Int. Microwave Symp.
-
-
Götzfried, R.1
Itoh, T.2
Luy, J.F.3
Schumacher, H.4
-
45
-
-
0030083354
-
"RF analog and digital circuits in SiGe technology,"
-
1996, pp. 82-83.
-
J. Long, M. Copeland, S. Kovacic, D. Malhi, and D. Harame, "RF analog and digital circuits in SiGe technology," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1996, pp. 82-83.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Long, J.1
Copeland, M.2
Kovacic, S.3
Malhi, D.4
Harame, D.5
-
46
-
-
0030269437
-
"A 5-GHz SiGe HBT return-tozero comparator for RF A/D conversion,"
-
vol. 31, pp. 1502-1506, 1996.
-
W. Gao, W. Snelgrove, and S. Kovacic, "A 5-GHz SiGe HBT return-tozero comparator for RF A/D conversion," IEEE J. Solid-State Circuits, vol. 31, pp. 1502-1506, 1996.
-
IEEE J. Solid-State Circuits
-
-
Gao, W.1
Snelgrove, W.2
Kovacic, S.3
-
47
-
-
0031072192
-
"A 1 Gb/s 8-channel array OEIC with SiGe photdetectors,"
-
1997, pp. 120-121.
-
M. Soda, T. Morikawa, S. Shioiri, H. Tezuka, F. Sato, T. Tatsumi, K. Emura, T. Tashiro, "A 1 Gb/s 8-channel array OEIC with SiGe photdetectors," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1997, pp. 120-121.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Soda, M.1
Morikawa, T.2
Shioiri, S.3
Tezuka, H.4
Sato, F.5
Tatsumi, T.6
Emura, K.7
Tashiro, T.8
-
48
-
-
0031071685
-
"42 GHz static frequency divider in Si/SiGe bipolar technology,"
-
1997, pp. 122-123.
-
M. Wurzer, T. Miester, H. Schäfer, H. Knapp, J. Bock, R. Stengl, K. Aufinger, M. Franosch, M. Rest, M. Möller, H.-M. Rein, and A. Felder, "42 GHz static frequency divider in Si/SiGe bipolar technology," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1997, pp. 122-123.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Wurzer, M.1
Miester, T.2
Schäfer, H.3
Knapp, H.4
Bock, J.5
Stengl, R.6
Aufinger, K.7
Franosch, M.8
Rest, M.9
Möller, M.10
Rein, H.-M.11
Felder, A.12
-
49
-
-
0031073056
-
"A 4 b 8 GSample/s A/D converter in SiGe bipolar technology,"
-
1997, pp. 124-125.
-
P. Xiao, K. Jenkins, M. Soyuer, H. Ainspan, J. Burghartz, H. Shin, M. Dolan, and D. Harame, "A 4 b 8 GSample/s A/D converter in SiGe bipolar technology," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1997, pp. 124-125.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Xiao, P.1
Jenkins, K.2
Soyuer, M.3
Ainspan, H.4
Burghartz, J.5
Shin, H.6
Dolan, M.7
Harame, D.8
-
50
-
-
33747263887
-
-
10 Gb/s SiGe bipolar framer/demultiplexer for SDH system," presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
S. Shiori, M. Soda, R. Morikawa, T. Hashimoto, F. Sato, and K. Emura, "A 10 Gb/s SiGe bipolar framer/demultiplexer for SDH system," presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
"A
-
-
Shiori, S.1
Soda, M.2
Morikawa, R.3
Hashimoto, T.4
Sato, F.5
Emura, K.6
-
51
-
-
0031655067
-
-
40 Gb/s analog 1C chipset for optical receiver using SiGe HBT's," presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
T. Masuda, K.-I. Ohhata, E. Ohue, K. Oda, M. Tanabe, H. Shimamoto, T. Onai, and K. Washio, "40 Gb/s analog 1C chipset for optical receiver using SiGe HBT's," presented at the IEEE Int. Solid-State Circuits Conf., Feb. 1998.
-
"
-
-
Masuda, T.1
Ohhata, K.-I.2
Ohue, E.3
Oda, K.4
Tanabe, M.5
Shimamoto, H.6
Onai, T.7
Washio, K.8
-
52
-
-
84864384696
-
"Physics and applications of Ge-Sii-/Si strained layer heterostructures,"
-
22, p. 1696, Oct. 1986.
-
R. People, "Physics and applications of Ge-Sii-/Si strained layer heterostructures," IEEE J. Quantum Electron., Vol. QE22, p. 1696, Oct. 1986.
-
IEEE J. Quantum Electron., Vol. QE
-
-
People, R.1
-
53
-
-
0025575664
-
"SiGe-base heterojunction bipolar transistors: Physics and design issues,"
-
1990, pp. 13-16.
-
G. L. Patton, J. M. C. Stork, J. H. Comfort, E. F. Crabbé, B. S. Meyerson, D. L. Harame, and J. Y.-C. Sun, "SiGe-base heterojunction bipolar transistors: Physics and design issues," Tech. Dig. Int. Electron Device Meeting, 1990, pp. 13-16.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Patton, G.L.1
Stork, J.M.C.2
Comfort, J.H.3
Crabbé, E.F.4
Meyerson, B.S.5
Harame, D.L.6
Sun, J.Y.-C.7
-
54
-
-
33746991507
-
"UHV/CVD growth of Si and SiGe alloys: Chemistry, physics, and device applications,"
-
vol. 80, p. 1592, June 1992.
-
B. Meyerson, "UHV/CVD growth of Si and SiGe alloys: Chemistry, physics, and device applications," Proc. IEEE, vol. 80, p. 1592, June 1992.
-
Proc. IEEE
-
-
Meyerson, B.1
-
55
-
-
0028044386
-
"Silicon-germanium heterojunction bipolar technology: The next leap in silicon?,"
-
1994, pp. 24-27.
-
J. D. Cressler, D. L. Harame, J. H. Comfort, J. M. C. Stork, B. S. Meyerson, and T. E. Tice, "Silicon-germanium heterojunction bipolar technology: The next leap in silicon?," Tech. Dig. IEEE Int. Solid-State Circuits Conf., 1994, pp. 24-27.
-
Tech. Dig. IEEE Int. Solid-State Circuits Conf.
-
-
Cressler, J.D.1
Harame, D.L.2
Comfort, J.H.3
Stork, J.M.C.4
Meyerson, B.S.5
Tice, T.E.6
-
56
-
-
0028734104
-
"SiGe HBT's reach the microwave and millimeter-wave frontier,"
-
1994, pp. 155-162.
-
C. Kermarrec, T. Tewksbury, G. Dawe, R. Baines, B. Meyerson, D. Harame, and M. Gilbert, "SiGe HBT's reach the microwave and millimeter-wave frontier," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1994, pp. 155-162.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Kermarrec, C.1
Tewksbury, T.2
Dawe, G.3
Baines, R.4
Meyerson, B.5
Harame, D.6
Gilbert, M.7
-
57
-
-
0029271142
-
"Re-engineering silicon: Si-Ge heterojunction bipolar technology,"
-
49-55, Mar. 1995.
-
J. D. Cressler, "Re-engineering silicon: Si-Ge heterojunction bipolar technology," IEEE Spectrum Mag., pp. 49-55, Mar. 1995.
-
IEEE Spectrum Mag., Pp.
-
-
Cressler, J.D.1
-
58
-
-
0029276715
-
"Si/SiGe epitaxial-base transistors: Part I-Materials, physics, and circuits,"
-
vol. 40, pp. 455-68, Mar. 1995.
-
D. L. Harame, J. H. Comfort, J. D. Cressler, E. F. Crabbé, J. Y.-C. Sun, B. S. Meyerson, and T. Tice, "Si/SiGe epitaxial-base transistors: Part I-Materials, physics, and circuits," IEEE Trans. Electron Devices, vol. 40, pp. 455-68, Mar. 1995.
-
IEEE Trans. Electron Devices
-
-
Harame, D.L.1
Comfort, J.H.2
Cressler, J.D.3
Crabbé, E.F.4
Sun, J.Y.-C.5
Meyerson, B.S.6
Tice, T.7
-
59
-
-
0029274349
-
"Si/SiGe epitaxial-base transistors: Part II-Process integration and analog applications,"
-
vol. 40, pp. 469-82, Mar. 1995.
-
D. L. Harame, J. H. Comfort, J. D. Cressler, E. F. Crabbé, J. Y.-C. Sun, B. S. Meyerson, and T. Tice, "Si/SiGe epitaxial-base transistors: Part II-Process integration and analog applications," IEEE Trans. Electron Devices, vol. 40, pp. 469-82, Mar. 1995.
-
IEEE Trans. Electron Devices
-
-
Harame, D.L.1
Comfort, J.H.2
Cressler, J.D.3
Crabbé, E.F.4
Sun, J.Y.-C.5
Meyerson, B.S.6
Tice, T.7
-
60
-
-
0031384517
-
"High-performance BiCMOS process integration: Trends, issues, and future directions,"
-
1997, pp. 36-3.
-
D. L. Harame, "High-performance BiCMOS process integration: Trends, issues, and future directions," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1997, pp. 36-3.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Harame, D.L.1
-
61
-
-
5844399719
-
"Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition,"
-
vol. 48, pp. 797-799, 1986.
-
B. S. Meyerson, "Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition," Appl. Phys. Lett., vol. 48, pp. 797-799, 1986.
-
Appl. Phys. Lett.
-
-
Meyerson, B.S.1
-
62
-
-
36549102226
-
"Low-frequency noise in self-aligned bipolar transistors,"
-
vol. 62, pp. 1335-1339, 1987.
-
P.-F. Lu, "Low-frequency noise in self-aligned bipolar transistors," J. Appl. Phys., vol. 62, pp. 1335-1339, 1987.
-
J. Appl. Phys.
-
-
Lu, P.-F.1
-
63
-
-
0029486674
-
"Lowfrequency noise in UHV/CVD Si- And SiGe-base bipolar transistors,"
-
1995, pp. 125-128.
-
L. Vempati, J. D. Cressler, J. Babcock, R. Jaeger, and D. Harame, "Lowfrequency noise in UHV/CVD Si- and SiGe-base bipolar transistors," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1995, pp. 125-128.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Vempati, L.1
Cressler, J.D.2
Babcock, J.3
Jaeger, R.4
Harame, D.5
-
64
-
-
0029771682
-
"Low-frequency noise characteristics of UHV/CVD epitaxial Si- And SiGe-base bipolar transistors,"
-
vol. 17, pp. 13-15, Jan. 1996.
-
J. D. Cressler, L. Vempati, J. A. Babcock, R. C. Jaeger, and D. L. Harame, "Low-frequency noise characteristics of UHV/CVD epitaxial Si- and SiGe-base bipolar transistors," IEEE Electron Device Lett., vol. 17, pp. 13-15, Jan. 1996.
-
IEEE Electron Device Lett.
-
-
Cressler, J.D.1
Vempati, L.2
Babcock, J.A.3
Jaeger, R.C.4
Harame, D.L.5
-
65
-
-
0030270208
-
"Low-frequency noise in UHV/CVD epitaxial Si- And SiGe-base bipolar transistors,"
-
vol. 31, pp. 1458-1467, Oct. 1996.
-
L. Vempati, J. D. Cressler, J. Babcock, R. Jaeger, and D. Harame, "Low-frequency noise in UHV/CVD epitaxial Si- and SiGe-base bipolar transistors," IEEE J. Solid-State Circuits, vol. 31, pp. 1458-1467, Oct. 1996.
-
IEEE J. Solid-State Circuits
-
-
Vempati, L.1
Cressler, J.D.2
Babcock, J.3
Jaeger, R.4
Harame, D.5
-
66
-
-
0028483408
-
"Tradeoff between I// noise and microwave performance in AlGaAs/GaAs heterojunction bipolar transistors,"
-
vol. 41, pp. 1347-1350, Aug. 1994.
-
D. Costa, M. N. Tutt, A. Khatibzadeh, and D. Pavlidis, "Tradeoff between I// noise and microwave performance in AlGaAs/GaAs heterojunction bipolar transistors," IEEE Trans. Electron Devices, vol. 41, pp. 1347-1350, Aug. 1994.
-
IEEE Trans. Electron Devices
-
-
Costa, D.1
Tutt, M.N.2
Khatibzadeh, A.3
Pavlidis, D.4
-
67
-
-
0027608465
-
"l// noise in n-p-n GaAs/AlGaAs heterojunction bipolar transistors: Impact of intrinsic transistor and parasitic series resistance,"
-
vol. 40, pp. 1148-1153, June 1993.
-
T. G. M. Kleinpenning and A. J. Holden, "l// noise in n-p-n GaAs/AlGaAs heterojunction bipolar transistors: Impact of intrinsic transistor and parasitic series resistance," IEEE Trans. Electron Devices, vol. 40, pp. 1148-1153, June 1993.
-
IEEE Trans. Electron Devices
-
-
Kleinpenning, T.G.M.1
Holden, A.J.2
-
68
-
-
0029291962
-
"Low-frequency noise in polysilicon emitter bipolar transistors,"
-
vol. 42, pp. 720-727, Apr. 1995.
-
H. A. W. Markus and T. G. M. Kleinpenning, "Low-frequency noise in polysilicon emitter bipolar transistors," IEEE Trans. Electron Devices, vol. 42, pp. 720-727, Apr. 1995.
-
IEEE Trans. Electron Devices
-
-
Markus, H.A.W.1
Kleinpenning, T.G.M.2
-
69
-
-
0028530385
-
"I// noise characterization of base current and emitter interfacial oxide breakup in n-p-n polyemitter bipolar transistors,"
-
vol. 15, pp. 430-132, Oct. 1994.
-
D. S. Quon, G. J. Sonek, and G. P. Li, "I// noise characterization of base current and emitter interfacial oxide breakup in n-p-n polyemitter bipolar transistors," IEEE Electron Device Lett., vol. 15, pp. 430-132, Oct. 1994.
-
IEEE Electron Device Lett.
-
-
Quon, D.S.1
Sonek, G.J.2
Li, G.P.3
-
70
-
-
0028124065
-
"Low-noise performance of SiGe heterojunction bipolar transistors,"
-
1994, pp. 1167-1170.
-
H. Schumacher, U. Erben, and A. Gruhle, "Low-noise performance of SiGe heterojunction bipolar transistors," Tech. Dig. IEEE MTTS Int. Microwave Symp., 1994, pp. 1167-1170.
-
Tech. Dig. IEEE MTTS Int. Microwave Symp.
-
-
Schumacher, H.1
Erben, U.2
Gruhle, A.3
-
71
-
-
33747245118
-
-
W. E. Ansley, J. D. Cressler, and D. M. Richey, "Base profile optimization for minimum noise figure in advanced UHV/CVD SiGe HBT's," this issue, pp. 652-659.
-
"Base profile optimization for minimum noise figure in advanced UHV/CVD SiGe HBT's," this issue, pp. 652-659
-
-
Ansley, W.E.1
Cressler, J.D.2
Richey, D.M.3
-
72
-
-
0029359320
-
"Ionizing radiation tolerance and low-frequency noise degradation in UHV/CVD SiGe HBT's,"
-
vol. 16, pp. 351-353, Aug. 1995.
-
J. A. Babcock, J. D. Cressler, L. S. Vempati, S. D. Clark, R. C. Jaeger, and D. L. Harame, "Ionizing radiation tolerance and low-frequency noise degradation in UHV/CVD SiGe HBT's," IEEE Electron Device Lett., vol. 16, pp. 351-353, Aug. 1995.
-
IEEE Electron Device Lett.
-
-
Babcock, J.A.1
Cressler, J.D.2
Vempati, L.S.3
Clark, S.D.4
Jaeger, R.C.5
Harame, D.L.6
-
73
-
-
0029533502
-
"Ionizing radiation tolerance of high-performance SiGe HBT's grown by UHV/CVD,"
-
vol. 42, pp. 1558-1567, Dec. 1995.
-
_, "Ionizing radiation tolerance of high-performance SiGe HBT's grown by UHV/CVD," IEEE Trans. Nucl. Sei., vol. 42, pp. 1558-1567, Dec. 1995.
-
IEEE Trans. Nucl. Sei.
-
-
-
74
-
-
0031379594
-
"Neutron radiation tolerance of advanced UHV/CVD SiGe HBT BiCMOS technology,"
-
vol. 44, pp. 1965-1973, Dec. 1997.
-
J. Roldân, W. E. Ansley, J. D. Cressler, S. D. Clark, and D. NguyenNgoc, "Neutron radiation tolerance of advanced UHV/CVD SiGe HBT BiCMOS technology," IEEE Trans. Nucl. Sei., vol. 44, pp. 1965-1973, Dec. 1997.
-
IEEE Trans. Nucl. Sei.
-
-
Roldân, J.1
Ansley, W.E.2
Cressler, J.D.3
Clark, S.D.4
Nguyenngoc, D.5
-
75
-
-
0032311695
-
-
J. Roldân, G. F. Niu, W. E. Ansley, J. D. Cressler, and S. D. Clark, "An investigation of the spatial location of proton-induced traps in SiGe HBT's," to be presented at the Nucl. Space Radiation Effects Conf., 1998.
-
"An investigation of the spatial location of proton-induced traps in SiGe HBT's," to be presented at the Nucl. Space Radiation Effects Conf., 1998
-
-
Roldân, J.1
Niu, G.F.2
Ansley, W.E.3
Cressler, J.D.4
Clark, S.D.5
-
76
-
-
0029543722
-
"Degradation of SiGe epitaxial heterojunction bipolar transistors by 1-MeV fast neutrons,"
-
vol. 42, pp. 1550-1557, Dec. 1995.
-
H. Ohyama, J. Vanhellemont, Y. Takami, K. Hayama, H. Sunaga, J. Poortmans, and M. Caymax, "Degradation of SiGe epitaxial heterojunction bipolar transistors by 1-MeV fast neutrons," IEEE Trans. Nucl. Sei., vol. 42, pp. 1550-1557, Dec. 1995.
-
IEEE Trans. Nucl. Sei.
-
-
Ohyama, H.1
Vanhellemont, J.2
Takami, Y.3
Hayama, K.4
Sunaga, H.5
Poortmans, J.6
Caymax, M.7
-
77
-
-
0025576839
-
"The low temperature operation of Si and SiGe bipolar transistors,"
-
1990, pp. 17-20.
-
E. F. Crabbé, G. L. Patton, J. M. C. Stork, J. H. Comfort, B. S. Meyerson, and J. Y.-C. Sun, "The low temperature operation of Si and SiGe bipolar transistors," Tech. Dig. Int. Electron Device Meeting, 1990, pp. 17-20.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Crabbé, E.F.1
Patton, G.L.2
Stork, J.M.C.3
Comfort, J.H.4
Meyerson, B.S.5
Sun, J.Y.-C.6
-
78
-
-
0026140099
-
"Sub 30-ps ECL circuit Operation at liquid nitrogen temperature using self-aligned epitaxial SiGe-base bipolar transistors,"
-
vol. 12, pp. 166-168, Apr. 1991.
-
J. D. Cressler, J. H. Comfort, E. F. Crabbé, G. L. Patton, W. Lee, J. Y.C. Sun, J. M. C. Stork, and B. S. Meyerson, "Sub 30-ps ECL circuit Operation at liquid nitrogen temperature using self-aligned epitaxial SiGe-base bipolar transistors," IEEE Electron Device Lett., vol. 12, pp. 166-168, Apr. 1991.
-
IEEE Electron Device Lett.
-
-
Cressler, J.D.1
Comfort, J.H.2
Crabbé, E.F.3
Patton, G.L.4
Lee, W.5
Sun, J.Y.C.6
Stork, J.M.C.7
Meyerson, B.S.8
-
79
-
-
0027556076
-
"On thé profile design and optimization of epitaxial Si- And SiGe-base bipolar technology for 77 K applications-Part I: Transistor dc design considerations,"
-
vol. 40, pp. 525-541, Mar. 1993.
-
J. D. Cressler, J. H. Comfort, E. F. Crabbé, G. L. Patton, J. M. C. Stork, J. Y.-C. Sun, and B. S. Meyerson, "On thé profile design and optimization of epitaxial Si- and SiGe-base bipolar technology for 77 K applications-Part I: Transistor dc design considerations," IEEE Trans. Electron Devices, vol. 40, pp. 525-541, Mar. 1993.
-
IEEE Trans. Electron Devices
-
-
Cressler, J.D.1
Comfort, J.H.2
Crabbé, E.F.3
Patton, G.L.4
Stork, J.M.C.5
Sun, J.Y.-C.6
Meyerson, B.S.7
-
80
-
-
0027556075
-
"On the profile design and optimization of epitaxial Si- And SiGe-base bipolar technology for 77 K applications-Part II: Circuit performance issues,"
-
vol. 40, pp. 542-556, Mar. 1993.
-
J. D. Cressler, E. F. Crabbé, J. H. Comfort, J. M. C. Stork, and J. Y.-C. Sun, "On the profile design and optimization of epitaxial Si- and SiGe-base bipolar technology for 77 K applications-Part II: Circuit performance issues," IEEE Trans. Electron Devices, vol. 40, pp. 542-556, Mar. 1993.
-
IEEE Trans. Electron Devices
-
-
Cressler, J.D.1
Crabbé, E.F.2
Comfort, J.H.3
Stork, J.M.C.4
Sun, J.Y.-C.5
-
81
-
-
0028538817
-
"An epitaxial emitter cap SiGe-base bipolar technology for liquid nitrogen temperature operation,"
-
vol. 15, pp. 472-74, Nov. 1994.
-
J. D. Cressler, E. F. Crabbé, J. H. Comfort, J. Y.-C. Sun, and J. M. C. Stork, "An epitaxial emitter cap SiGe-base bipolar technology for liquid nitrogen temperature operation," IEEE Electron Device Lett., vol. 15, pp. 472-74, Nov. 1994.
-
IEEE Electron Device Lett.
-
-
Cressler, J.D.1
Crabbé, E.F.2
Comfort, J.H.3
Sun, J.Y.-C.4
Stork, J.M.C.5
-
82
-
-
0026222374
-
"Parasitic energy barriers in SiGe HBT's,"
-
vol. 12, pp. 486-88, Sept. 1991.
-
J. W. Slotboom, G. Streutker, A. Pruijmboom, and D. J. Gravesteijn, "Parasitic energy barriers in SiGe HBT's," IEEE Electron Device Lett., vol. 12, pp. 486-88, Sept. 1991.
-
IEEE Electron Device Lett.
-
-
Slotboom, J.W.1
Streutker, G.2
Pruijmboom, A.3
Gravesteijn, D.J.4
-
83
-
-
0027574261
-
"Current gain rolloff in graded-base SiGe heterojunction bipolar transistors,"
-
vol. 14, pp. 193-195, Apr. 1993.
-
E. F. Crabbé, J. D. Cressler, G. L. Patton, J. M. C. Stork, J. H. Comfort, and J. Y.-C. Sun, "Current gain rolloff in graded-base SiGe heterojunction bipolar transistors," IEEE Electron Device Lett., vol. 14, pp. 193-195, Apr. 1993.
-
IEEE Electron Device Lett.
-
-
Crabbé, E.F.1
Cressler, J.D.2
Patton, G.L.3
Stork, J.M.C.4
Comfort, J.H.5
Sun, J.Y.-C.6
-
84
-
-
0031333533
-
"The impact of Ge profile shape on the operation of SiGe HBT precision voltage references,"
-
1997, pp. 100-103.
-
S. L. Salmon, J. D. Cressler, R. C. Jaeger, and D. L. Harame, "The impact of Ge profile shape on the operation of SiGe HBT precision voltage references," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1997, pp. 100-103.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Salmon, S.L.1
Cressler, J.D.2
Jaeger, R.C.3
Harame, D.L.4
-
85
-
-
0029546477
-
"Neutral base recombination in advanced SiGe HBT's and its impact on the temperature characteristics of precision analog circuits,"
-
1995, pp. 755-758.
-
A. J. Joseph, J. D. Cressler, R. C. Jaeger, D. Richey, and D. L. Harame, "Neutral base recombination in advanced SiGe HBT's and its impact on the temperature characteristics of precision analog circuits," Tech. Dig. IEEE Int. Electron Device Meeting, 1995, pp. 755-758.
-
Tech. Dig. IEEE Int. Electron Device Meeting
-
-
Joseph, A.J.1
Cressler, J.D.2
Jaeger, R.C.3
Richey, D.4
Harame, D.L.5
-
86
-
-
0031104183
-
"Neutral base recombination and its influence on the temperature dependence of early voltage and current-gain early voltage product in UHV/CVD SiGe heterojunction bipolar transistors,"
-
vol. 44, pp. 404-413, Mar. 1997.
-
A. J. Joseph, J. D. Cressler, D. M. Richey, R. C. Jaeger, and D. L. Harame, "Neutral base recombination and its influence on the temperature dependence of early voltage and current-gain early voltage product in UHV/CVD SiGe heterojunction bipolar transistors," IEEE Trans. Electron Devices, vol. 44, pp. 404-413, Mar. 1997.
-
IEEE Trans. Electron Devices
-
-
Joseph, A.J.1
Cressler, J.D.2
Richey, D.M.3
Jaeger, R.C.4
Harame, D.L.5
-
87
-
-
0030399677
-
"Impact of profile scaling on high-injection barrier effects in advanced UHV/CVD SiGe HBT's,"
-
1996, pp. 253-256.
-
A. J. Joseph, J. D. Cressler, D. Richey, and D. Harame, "Impact of profile scaling on high-injection barrier effects in advanced UHV/CVD SiGe HBT's," Tech. Dig. IEEE Int. Electron Device Meeting, 1996, pp. 253-256.
-
Tech. Dig. IEEE Int. Electron Device Meeting
-
-
Joseph, A.J.1
Cressler, J.D.2
Richey, D.3
Harame, D.4
-
88
-
-
0028744030
-
"Effect of current and voltage stress on the dc characteristics of SiGe-base heterojunction bipolar transistors,"
-
1994, pp. 209-212.
-
K. Liao, R. Rief, and T. Kamins, "Effect of current and voltage stress on the dc characteristics of SiGe-base heterojunction bipolar transistors," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1994, pp. 209-212.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Liao, K.1
Rief, R.2
Kamins, T.3
-
89
-
-
0029546463
-
"Correlation of low-frequency noise and emitter-base reverse-bias stress in epitaxial Si-and SiGe-base bipolar transistors,"
-
1995, pp. 357-360.
-
J. A. Babcock, J. D. Cressler, L. Vempati, A. Joseph, and D. Harame, "Correlation of low-frequency noise and emitter-base reverse-bias stress in epitaxial Si-and SiGe-base bipolar transistors," Tech. Dig. IEEE Int. Electron Device Meeting, 1995, pp. 357-360.
-
Tech. Dig. IEEE Int. Electron Device Meeting
-
-
Babcock, J.A.1
Cressler, J.D.2
Vempati, L.3
Joseph, A.4
Harame, D.5
-
90
-
-
0030150147
-
"Comparison of time-to-failure of GeSi and Si bipolar transistors,"
-
vol. 17, pp. 211-213, Apr. 1996.
-
A. Neugroschel, C.-T. Sah, J. M. Ford, J. Steele, R. Tang, and C. Stein, "Comparison of time-to-failure of GeSi and Si bipolar transistors," IEEE Electron Device Lett., vol. 17, pp. 211-213, Apr. 1996.
-
IEEE Electron Device Lett.
-
-
Neugroschel, A.1
Sah, C.-T.2
Ford, J.M.3
Steele, J.4
Tang, R.5
Stein, C.6
-
91
-
-
0031103665
-
"Scaling issues and Ge profile optimization in advanced UHV/CVD SiGe HBT's,"
-
vol. 44, pp. 431-440, Mar. 1997.
-
D. M. Richey, J. D. Cressler, and A. J. Joseph, "Scaling issues and Ge profile optimization in advanced UHV/CVD SiGe HBT's," IEEE Trans. Electron Devices, vol. 44, pp. 431-440, Mar. 1997.
-
IEEE Trans. Electron Devices
-
-
Richey, D.M.1
Cressler, J.D.2
Joseph, A.J.3
-
92
-
-
84886448070
-
"130 GHz
-
1997, pp. 791-794.
-
K. Oda, E. Ohue, M. Tanabe, H. Shimamoto, T. Onai, and K. Washio, "130 GHz f-p SiGe HBT technology," in Tech. Dig. Int. Electron Device Meeting, 1997, pp. 791-794.
-
F-p SiGe HBT Technology," in Tech. Dig. Int. Electron Device Meeting
-
-
Oda, K.1
Ohue, E.2
Tanabe, M.3
Shimamoto, H.4
Onai, T.5
Washio, K.6
-
93
-
-
0031336769
-
"High reliability metal insulator metal capacitors for silicon-germanium analog applications,"
-
1997, pp. 191-194.
-
K. Stein, J. Kocis, G. Hueckel, E. Eld, T. Bartush, R. Groves, N. Greco, D. Harame, and T. Tewksbury, "High reliability metal insulator metal capacitors for silicon-germanium analog applications," Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting, 1997, pp. 191-194.
-
Proc. IEEE Bipolar/BiCMOS Circuits Technol. Meeting
-
-
Stein, K.1
Kocis, J.2
Hueckel, G.3
Eld, E.4
Bartush, T.5
Groves, R.6
Greco, N.7
Harame, D.8
Tewksbury, T.9
-
94
-
-
0031233720
-
"Integrated RF components in a SiGe bipolar technology,"
-
vol. 32, pp. 1440-1445, Sept. 1997.
-
J. Burghartz, M. Soyuer, K. Jenkins, M. Kies, M. Dolan, K. Stein, J. Malinowski, and D. Harame, "Integrated RF components in a SiGe bipolar technology," IEEE J. Solid-State Circuits, vol. 32, pp. 1440-1445, Sept. 1997.
-
IEEE J. Solid-State Circuits
-
-
Burghartz, J.1
Soyuer, M.2
Jenkins, K.3
Kies, M.4
Dolan, M.5
Stein, K.6
Malinowski, J.7
Harame, D.8
-
95
-
-
0029518393
-
"High-Q inductors in standard silicon interconnect technology and its application to an integrated RF power amplifier,"
-
1995, pp. 1015-1017.
-
J. Burghartz, M. Soyuer, K. Jenkins, and M. Hulvey, "High-Q inductors in standard silicon interconnect technology and its application to an integrated RF power amplifier," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 1015-1017.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Burghartz, J.1
Soyuer, M.2
Jenkins, K.3
Hulvey, M.4
-
96
-
-
0031679534
-
"RF circuit design aspects of spiral inductors in silicon,"
-
1998, pp. 246-247.
-
J. Burghartz, D. Edelstein, M. Soyuer, H. Ainspan, and K. Jenkins, "RF circuit design aspects of spiral inductors in silicon," IEEE Int. Solid-State Circuits Conf., Feb. 1998, pp. 246-247.
-
IEEE Int. Solid-State Circuits Conf., Feb.
-
-
Burghartz, J.1
Edelstein, D.2
Soyuer, M.3
Ainspan, H.4
Jenkins, K.5
-
97
-
-
0029505739
-
"Ultra-low dc power GaAs HBT 5- And Cband low-noise amplifiers for portable wireless communications," IEEE Trans
-
vol. 43, pp. 3055-3061, Dec. 1995.
-
K. Kobayashi et al., "Ultra-low dc power GaAs HBT 5- and Cband low-noise amplifiers for portable wireless communications," IEEE Trans. Microwave Theory Tech, vol. 43, pp. 3055-3061, Dec. 1995.
-
Microwave Theory Tech
-
-
Kobayashi, K.1
-
98
-
-
33747258386
-
"Miniature low-noise variable MMIC amplifiers with low power consumption for L-band portable communications applications," in Tech. Dig. IEEE MTTS Int. Microwave Symp
-
1991, pp. 67-70.
-
S. Harra et al, "Miniature low-noise variable MMIC amplifiers with low power consumption for L-band portable communications applications," in Tech. Dig. IEEE MTTS Int. Microwave Symp., 1991, pp. 67-70.
-
Et Al
-
-
Harra, S.1
-
99
-
-
0029492704
-
"A 1.9-GHz low-voltage silicon bipolar receiver front-end for wireless personal communications systems,"
-
vol. 30, pp. 1438-1448, Dec. 1995.
-
J. Long and M. Copeland, "A 1.9-GHz low-voltage silicon bipolar receiver front-end for wireless personal communications systems," IEEE J. Solid-State Circuits, vol. 30, pp. 1438-1448, Dec. 1995.
-
IEEE J. Solid-State Circuits
-
-
Long, J.1
Copeland, M.2
-
100
-
-
0030382993
-
"A
-
2.7 V 900 MHz CMOS LNA and mixer," in Tech. Dig. IEEE Int. Solid-State Circuits Conf.. 1996, pp. 50-51.
-
A. Karanicolas et ai, "A 2.7 V 900 MHz CMOS LNA and mixer," in Tech. Dig. IEEE Int. Solid-State Circuits Conf.. 1996, pp. 50-51.
-
Et Ai
-
-
Karanicolas, A.1
-
101
-
-
0026882590
-
"Monolithic L-band amplifiers operating at milliwatt dc power consumption,"
-
1992, pp. 9-12.
-
K. Cioffi, "Monolithic L-band amplifiers operating at milliwatt dc power consumption," Tech. Dig. IEEE MMWMCS, 1992, pp. 9-12.
-
Tech. Dig. IEEE MMWMCS
-
-
Cioffi, K.1
-
102
-
-
0026403454
-
"A Si wide-band amplifier MMIC amplifier family for L-S band consumer product applications," in Tech
-
1991, pp. 1283-1284.
-
H. Takeuchi et al., "A Si wide-band amplifier MMIC amplifier family for L-S band consumer product applications," in Tech. Dig. IEEE MTTS Int. Microwave Symp.. 1991, pp. 1283-1284.
-
Dig. IEEE MTTS Int. Microwave Symp..
-
-
Takeuchi, H.1
-
103
-
-
0031651564
-
"A fully-integrated CMOS 900 MHz LNA utilizing monolithic trasnformers,"
-
1998, pp. 132-133.
-
J.-J. Zhou and D. Allstot, "A fully-integrated CMOS 900 MHz LNA utilizing monolithic trasnformers," IEEE Int. Solid-State Circuits Conf.. Feb. 1998, pp. 132-133.
-
IEEE Int. Solid-State Circuits Conf.. Feb.
-
-
Zhou, J.-J.1
Allstot, D.2
-
104
-
-
0031147079
-
"A 1.5 V, 1.5 GHz CMOS low noise amplifier,"
-
vol. 32, pp. 745-759, May 1997.
-
D. Shaeffer and T. Lee, "A 1.5 V, 1.5 GHz CMOS low noise amplifier," IEEE J. Solid-State Circuits, vol. 32, pp. 745-759, May 1997.
-
IEEE J. Solid-State Circuits
-
-
Shaeffer, D.1
Lee, T.2
-
105
-
-
0027830179
-
"An L-band ultra low power consumption monolithic low noise amplifier,"
-
1C Symp.. 1993, pp. 45-8.
-
M. Nakatsugawa, Y. Yamaguchi, and M. Muraguchi, "An L-band ultra low power consumption monolithic low noise amplifier," Tech. Dig. GaAs 1C Symp.. 1993, pp. 45-8.
-
Tech. Dig. GaAs
-
-
Nakatsugawa, M.1
Yamaguchi, Y.2
Muraguchi, M.3
-
106
-
-
0027794807
-
"Ultra low power low noise amplifiers for wireless communications," in Tech. Dig. GaAs
-
1C Symp.. 1993, pp. 49-51.
-
E. Heaney et al, "Ultra low power low noise amplifiers for wireless communications," in Tech. Dig. GaAs 1C Symp.. 1993, pp. 49-51.
-
Et Al
-
-
Heaney, E.1
-
107
-
-
0030244457
-
"1-W SiGe power HBT's for mobile communications,"
-
vol. 6, pp. 341-343, Mar. 1996.
-
A. Schuppen, S. Gerlach, H. Dietrich, D. Wandrei, U. Seiler, and U. König, "1-W SiGe power HBT's for mobile communications," IEEE Microwave Guided Wave Lett., vol. 6, pp. 341-343, Mar. 1996.
-
IEEE Microwave Guided Wave Lett.
-
-
Schuppen, A.1
Gerlach, S.2
Dietrich, H.3
Wandrei, D.4
Seiler, U.5
König, U.6
-
108
-
-
0030399112
-
"A 230-watt 5-band SiGe heterojunction junction bipolar transistor,"
-
vol. 44, pp. 2392-2397, Dec. 1996.
-
P. A. Potyraj, K. J. Petrosky, K. D. Hobart, F. J. Kub, and P. E. Thompson, "A 230-watt 5-band SiGe heterojunction junction bipolar transistor," IEEE Trans. Microwave Theory Tech., vol. 44, pp. 2392-2397, Dec. 1996.
-
IEEE Trans. Microwave Theory Tech.
-
-
Potyraj, P.A.1
Petrosky, K.J.2
Hobart, K.D.3
Kub, F.J.4
Thompson, P.E.5
-
109
-
-
84886448112
-
"Large-signal performance of high-BVceo graded epibase SiGe HBT's at wireless frequencies,"
-
1997, pp. 799-802.
-
D. R. Greenberg, M. Rivier, P. Girard, E. Bergeault, J. Moniz, D. Ahlgren, G. Freeman, S. Subbanna, S. J. Jeng, K. Stein, D. NguyenNgoc, K. Schonenberg, J. Malinowski, D. Colavito, D. L. Harame, and B. Meyerson, "Large-signal performance of high-BVceo graded epibase SiGe HBT's at wireless frequencies," Tech. Dig. Int. Electron Device Meeting, 1997, pp. 799-802.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Greenberg, D.R.1
Rivier, M.2
Girard, P.3
Bergeault, E.4
Moniz, J.5
Ahlgren, D.6
Freeman, G.7
Subbanna, S.8
Jeng, S.J.9
Stein, K.10
Nguyenngoc, D.11
Schonenberg, K.12
Malinowski, J.13
Colavito, D.14
Harame, D.L.15
Meyerson, B.16
-
110
-
-
0000843292
-
"Physical limitations on frequency and power parameters of transistors,"
-
163-177, 1965.
-
E. O. Johnson, "Physical limitations on frequency and power parameters of transistors," RCA Rev., pp. 163-177, 1965.
-
RCA Rev., Pp.
-
-
Johnson, E.O.1
-
111
-
-
84886448021
-
"A selective-epitaxial SiGe HBT with SMI electrodes featuring 9.3 ps ECL gate-delay,"
-
1997, pp. 795-798.
-
[Ill] K. Washio, E. Ohue, K. Oda, M. Tanabe, H. Shimamoto, and T. Onai, "A selective-epitaxial SiGe HBT with SMI electrodes featuring 9.3 ps ECL gate-delay," Tech. Dig. Int. Electron Device Meeting, 1997, pp. 795-798.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Washio, K.1
Ohue, E.2
Oda, K.3
Tanabe, M.4
Shimamoto, H.5
Onai, T.6
-
112
-
-
0029491472
-
"Enhanced SiGe heterojunction bipolar transistors with 160 GHz /max,"
-
1995, pp. 743-746.
-
A. Schuppen, U. Erben, A. Gruhle, H. Kibbel, H. Schumacher, and U. König, "Enhanced SiGe heterojunction bipolar transistors with 160 GHz /max," Tech. Dig. Int. Electron Device Meeting, 1995, pp. 743-746.
-
Tech. Dig. Int. Electron Device Meeting
-
-
Schuppen, A.1
Erben, U.2
Gruhle, A.3
Kibbel, H.4
Schumacher, H.5
König, U.6
-
113
-
-
0030389382
-
"Suppression of boron out-diffusion in SiGe HBT's by carbon incorporation,"
-
1996, pp. 249-252.
-
L. Lanzerotti, J. Sturm, E. Stach, R. Hull, T. Buyuklimanli, and C. Magee, "Suppression of boron out-diffusion in SiGe HBT's by carbon incorporation," Tech. Dig. IEEE Int. Electron Device Meeting, 1996, pp. 249-252.
-
Tech. Dig. IEEE Int. Electron Device Meeting
-
-
Lanzerotti, L.1
Sturm, J.2
Stach, E.3
Hull, R.4
Buyuklimanli, T.5
Magee, C.6
|