Gas phase preparation and analysis of semiconductor surfaces in a clustered reactor apparatus

Review of Scientific Instruments

Volumn 77, Issue 9, 2006, Pages

  Finstad, Casey C ^a   Montaño Miranda, Gerardo ^a   Thorsness, Adam G ^a   Muscat, Anthony J ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLUSTERED REACTOR APPARATUS; GAS PHASE PREPARATION; SEMICONDUCTOR SURFACES; VACUUM CHAMBER;

ANNEALING; HYDROGEN BONDS; IMPURITIES; PHASE COMPOSITION; SEMICONDUCTOR MATERIALS; VACUUM APPLICATIONS;

CHEMICAL REACTORS;

EID: 33749334801     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2349319     Document Type: Article

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