Native oxide removal from SiGe using mixtures of HF and water delivered by aqueous, gas, and supercritical CO2 processes

Materials Science in Semiconductor Processing

Volumn 8, Issue 1-3 SPEC. ISS., 2005, Pages 231-237

  Xie, Bo ^a   Montaño Miranda, Gerardo ^a   Finstad, Casey C ^a   Muscat, Anthony J ^a  

^a University of Arizona   (United States)

Author keywords

Etching; HF water vapor; Liquid HF; Native oxide; SiGe; Supercritical CO2

Indexed keywords

APPROXIMATION THEORY; CARBON DIOXIDE; ETCHING; HETEROJUNCTION BIPOLAR TRANSISTORS; HIGH ELECTRON MOBILITY TRANSISTORS; MIXTURES; SAMPLING; X RAY PHOTOELECTRON SPECTROSCOPY;

HF/WATER VAPOR; LIQUID HF; NATIVE OXIDE; SIGE; SUPERCRITICAL CO2;

SILICON COMPOUNDS;

EID: 13244298516     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2004.09.104     Document Type: Conference Paper

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