Etching kinetics of silicon dioxide in aqueous fluoride Solutions: A surface complexation model

Journal of the Electrochemical Society

Volumn 143, Issue 4, 1996, Pages 1339-1347

  Osseo Asare, K ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COMPLEXATION; DISSOLUTION; ETCHING; HYDROFLUORIC ACID; INTERFACES (MATERIALS); IONS; MATHEMATICAL MODELS; POLARIZATION; REACTION KINETICS; SOLUTIONS; SURFACES;

AMMONIUM FLUORIDE; FLUORIDES; SURFACE COMPLEXATION MODEL; SURFACE LIGAND EXCHANGE REACTION;

SILICA;

EID: 0030126882     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836640     Document Type: Article

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