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Journal of the Electrochemical Society

Volumn 149, Issue 4, 2002, Pages

The use of unsaturated fluorocarbons for dielectric etch applications

(5) Chatterjee, Ritwik a Karecki, Simon a Reif, Rafael a Vartanian, Victor b Sparks, Terry b

a Massachusetts Institute of Technology Cambridge (United States)

b MOTOROLA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETHERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS EMISSIONS; HYDROGEN; ISOMERS; PHOTORESISTS; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

FLUORINATED ETHER; GLOBAL WARMING EMISSION; HEXAFLUOROBUTADIENE; HEXAFLUOROCYCLOBUTENE; HEXAFLUOROPROPENE; OCTAFLUOROCYCLOPENTENE; UNSATURATED FLUOROCARBONS;

FLUOROCARBONS;

EID: 0036531268 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1457988 Document Type: Article

Times cited : (34)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.