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Volumn 2005, Issue , 2005, Pages 60-63

Leakage current variability in nanometer technologies

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC NETWORK ANALYSIS; ELECTRIC POTENTIAL; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUITS; LEAKAGE CURRENTS; STATISTICAL METHODS;

EID: 33748886314     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWSOC.2005.78     Document Type: Conference Paper
Times cited : (27)

References (15)
  • 2
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    • S. Borkar and V. De, "Technology and design challenges for low power and high performance [microprocessors]," ISLPED 1999, pp. 163-168.
    • ISLPED 1999 , pp. 163-168
    • Borkar, S.1    De, V.2
  • 3
    • 4444351567 scopus 로고    scopus 로고
    • Parametric yield estimation considering leakage variability
    • Rajeev R. Rao et al., "Parametric yield estimation considering leakage variability," DAC 2004, pp.442-447.
    • DAC 2004 , pp. 442-447
    • Rao, R.R.1
  • 4
    • 0036923246 scopus 로고    scopus 로고
    • A 90-nm CMOS device technology with high-speed, general-purpose, and low-leakage transistors for system on chip applications
    • C.C.Wu et al. "A 90-nm CMOS device technology with high-speed, general-purpose, and low-leakage transistors for system on chip applications," IEDM 2002, pp.65-68.
    • IEDM 2002 , pp. 65-68
    • Wu, C.C.1
  • 5
    • 0041633858 scopus 로고    scopus 로고
    • Parameter variations and impact on circuits and microarchitecture
    • S. Borkar et al., "Parameter Variations and Impact on Circuits and Microarchitecture," DAC 2003, pp. 338-342.
    • DAC 2003 , pp. 338-342
    • Borkar, S.1
  • 6
    • 0037346053 scopus 로고    scopus 로고
    • Process and circuit design interlock for application-dependent scaling tradeoffs and optimization in the SoC era
    • Mar.
    • C. Diaz, M. Chang, T. Ong, and J. Sun, "Process and circuit design interlock for application-dependent scaling tradeoffs and optimization in the SoC era," IEEE Journal Solid State Circuits, Vol. 38, No. 3, Mar. 2003.
    • (2003) IEEE Journal Solid State Circuits , vol.38 , Issue.3
    • Diaz, C.1    Chang, M.2    Ong, T.3    Sun, J.4
  • 9
    • 0036954781 scopus 로고    scopus 로고
    • Modeling and analysis of leakage power considering within-die process variations
    • Ashish Srivastava et al., "Modeling and Analysis of Leakage Power Considering Within-Die Process Variations," ISLPED 2002, pp. 64-67.
    • ISLPED 2002 , pp. 64-67
    • Srivastava, A.1
  • 10
    • 1542329235 scopus 로고    scopus 로고
    • Modeling and estimation of total leakage current in nano-scaled-CMOS devices considering the effect of parameter variation
    • S. Mukhopadhyay, K. Roy, "Modeling and estimation of total leakage current in nano-scaled-CMOS devices considering the effect of parameter variation," ISLPED 2003, pp. 172-175.
    • ISLPED 2003 , pp. 172-175
    • Mukhopadhyay, S.1    Roy, K.2
  • 11
    • 0034454866 scopus 로고    scopus 로고
    • A 0.13 m CMOS technology with 193 nm lithography and Cu/low-k for high performance applications
    • K.K. Young et al, "A 0.13 m CMOS technology with 193 nm lithography and Cu/low-k for high performance applications," IEDM 2000, pp.563-566.
    • IEDM 2000 , pp. 563-566
    • Young, K.K.1
  • 12
    • 4544238811 scopus 로고    scopus 로고
    • 65nm CMOS high speed, general purpose and low power transistor technology for high volume foundry application
    • S.K.H.Fung et al., "65nm CMOS High Speed, General Purpose and Low Power Transistor Technology for High Volume Foundry Application", VLSI Technology 2004, pp. 92-93.
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    • Fung, S.K.H.1
  • 15
    • 0033281247 scopus 로고    scopus 로고
    • A 0.18 m CMOS logic technology with dual gate oxide and low-k interconnect for high-performance and low-power applications
    • C.H. Diaz et al., "A 0.18 m CMOS logic technology with dual gate oxide and low-k interconnect for high-performance and low-power applications," VLSI Technology Symposium 1999, pp. 11-12, 1999.
    • (1999) VLSI Technology Symposium 1999 , pp. 11-12
    • Diaz, C.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.