0.18 μm CMOS logic technology with dual gate oxide and low-k interconnect for high-performance and low-power applications

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 1999, Pages 11-12

  Diaz, C H ^a   Young, K L ^a   Hsu, J H ^a   Lin, J C H ^a   Hou, C S ^a   Lin, C T ^a   Liaw, J J ^a   Wu, C C ^a   Su, C W ^a   Wang, C H ^a   Ting, J K ^a   Yang, S S ^a   Lee, K Y ^a   Wu, S Y ^a   Tsai, C C ^a   et al , ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); LOGIC DEVICES; RANDOM ACCESS STORAGE; SEMICONDUCTING ALUMINUM COMPOUNDS;

CMOS LOGIC TECHNOLOGY; DUAL GATE OXIDE;

CMOS INTEGRATED CIRCUITS;

EID: 0033281247     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)